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Fundamental Solid-State Principles: Pictures Are Redrawn (With Some Modifications) From by Robert T. Paynter

This document provides an overview of fundamental solid-state principles related to semiconductors. It describes the relationship between valence electrons and conductivity, and how conductivity increases with temperature. It also contrasts trivalent and pentavalent doping elements, and describes how n-type and p-type semiconductors are formed. Finally, it explains how a depletion layer forms at a pn junction and how forward and reverse biasing can adjust the width of this layer.

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100% found this document useful (2 votes)
281 views31 pages

Fundamental Solid-State Principles: Pictures Are Redrawn (With Some Modifications) From by Robert T. Paynter

This document provides an overview of fundamental solid-state principles related to semiconductors. It describes the relationship between valence electrons and conductivity, and how conductivity increases with temperature. It also contrasts trivalent and pentavalent doping elements, and describes how n-type and p-type semiconductors are formed. Finally, it explains how a depletion layer forms at a pn junction and how forward and reverse biasing can adjust the width of this layer.

Uploaded by

MujtabaRafique
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
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Download as PPT, PDF, TXT or read online on Scribd
You are on page 1/ 31

Chapter 1

Fundamental Solid-
State Principles
Pictures are redrawn (with some modifications) from
Introductory Electronic Devices and Circuits
By
Robert T. Paynter

1
Objectives (1)
• Describe the relationship between the number of
valence electrons and conductivity properties.
• Describe the relationship between conduction and
temperature.
• Contrast trivalent and pentavalent elements.
• List the similarities and differences between n-
type and p-type semiconductors.
• Describe diffusion current.
• Describe how a depletion layer is formed around
a pn junction.

2
Objectives (2)
• Explain the source of barrier potential, and list
the barrier potential values for Si and Ge.
• Define bias.
• Desbribe the different methods of forward and
reverse biasing a pn junction.
• Explain why Si is used more commonly than Ge
in the production of solid state devices.

3
Fig. 1.1 Bohr Model of the atom.

Orbital shells

M
L
K

Valence shell

(a) (b)
Orbital shells are identified using the letters K through Q.

4
Relationship between Valence
Electrons and Conductivity
The conductivity decreases with an increase
in the number of valence electrons.

1 valence electron nearly perfect conductor


8 valence electrons insulator
(Max = 8)

5
Fig. 1.2 Semiconductor atoms.

4 valence electrons semiconductor

Silicon (Si) Germanium (Ge) Carbon (C)

6
Electrons in Orbital Shells
• Electrons travels only in orbital shells.
• Each orbital shells relates to a specific energy
range.
• An electron can jump from one orbital shell to
another that has higher energy level if the
electron absorbs energy equal to the energy
difference between the two orbital shells.
• After jumping to a higher energy shell, the
electron will eventually give up the energy and
return to a lower-energy shell.

7
Fig. 1.3 Silicon energy gaps and
levels.
Energy
Conduction band e4 = 1.8 eV
Valence
Energy gap
band
e3 = 0.7 eV
e2
e1

1.8 eV – 0.7 eV = 1.1 eV

8
Fig. 1.4 Silicon covalent bonding.

Intrinsic (pure) silicon is


Si a very poor conductor.

Si
Si
Energy gap of Si:
Si single atom = 0.05 eV
crystal = 0.7 eV
Si

9
Fig. 1.5 Generation of an
electron-hole pair.
Energy

Si Conduction band
Electrons
Si
Si Valence band
Si Holes

Si

10
Conduction vs Temperature
• At room temperature, thermal energy
(hear) causes the constant creation of
electron-hole pair, with their subsequent
recombination.

• Conductivity in a semiconductor varies


directly with temperature.

11
Table 1.1 Commonly used
doping elements.
Trivalent Impurities Pentavalent Impurities
(p-Type) (n-Type)
Aluminum (Al) Phosphorus (P)

Gallium (Ga) Arsenic (As)

Boron (B) Antimony (Sb)

Indium (In) Bismuth (Bi)

(Acceptor impurities) (Donor impurities)


12
Fig. 1.6 n-type material and
its energy diagram.
Energy
Excess covalent
Si bond electron
Conduction band
Si Electrons
(majority carriers)
As
Si Valence band
Holes
(minority carriers)
Si

Conductivity of n-type material is increased


due to more free-electrons.
13
Fig. 1.8 p-type material and
its energy diagram.
Energy

Si Covalent bond hole


Conduction band
Si Electrons
(minority carriers)
Al
Si Valence band
Holes
(majority carriers)
Si

Conductivity of p-type material is increased


due to more holes in valence band.
14
Doping Density
1 impurity atom per 105 to 108 Si atoms
and about 1022 Si atoms/cm3

1017 to 1014 impurity atom/cm3


(much more than heat-rupture electrons)

15
Effect of Doping on Conductivity

• At the rate 1 donor atom per 108 Si atoms, the


conductivity at 30°C is multiplied by a factor of
24,100.

• Conductivity in doping semiconductor is less


dependent on temperature.

16
Fig. 1.11 pn-junction initial
energy levels.
Junction

n p n p
Energy

Energy
Conduction band
Conduction band

Valence band
Valence band

(a) (b)

17
Fig. 1.12 The forming of the
depletion layer.
n p n p

Depletion layer
Energy

Energy

18
Fig. 1.13 Depletion Layer Charges.

n p
+4 +4

+4 +4
+5
Electric +3
field
+4 +4

+4 +4

Junction

Total (+) = 21 Total (+) = 19


Total (-) = 20 Total (-) = 20
Net charge = +1 Net charge = -1

19
Things to Remember
• Depletion layer (or region) is the
area around a pn junction that is
depleted of charge carriers.

• Barrier potential is the natural


potential across a pn junction.
(Barrier potential is typically in the
millivolt range.)

20
Depletion Layer Width vs
Junction Resistance

Depletion Junction Junction


layer width resistance current
Minimum Minimum Maximum
Maximum Maximum Minimum

21
Bias
• Applying the potential (bias) to a pn
junction, we can adjust the width of the
depletion layer.

• Forward bias is a potential to reduce the


depletion layer width and junction
resistance as a result.
• Reverse bias is a potential to increase the
depletion layer width and junction
resistance as a consequence.

22
Fig. 1.14 The effect of forward bias.

n p n p

V V
SW1 SW1

(a) An unbiased pn junction (b) Charge motion at the


moment SW1 is closed

n p
n p

Rn Rp
V
SW1
Rb

(c) Conduction increases as the (d) Bulk resistance


depletion layer becomes
narrower 23
Forward-biased pn junction.

A forward-biased pn junction showing the flow of


majority carriers and the voltage due to the
barrier potential across the depletion region.
24
Fig. 1.15 Some forward-
biased pn junction.
+V -V

p n

n p

25
Fig. 1.16 The effect of reverse bias.

n p n p

V V
SW1 SW1

(a) A conducting pn junction (b) A depletion layer forms


when there is no current

n p

V
SW1

(c) When the bias is reversed, the depletion


layer widens as charge carriers move away
from the junction
26
Reverse-biased pn junction.

The extremely small reverse current in a reverse-


biased pn junction is due to the minority carriers
from thermally generated electron-hole pairs.
27
Fig. 1.17 Some reverse-
biased pn junction.
+V -V

n p

p n

28
Fig. 1.18 pn-junction biasing.
Forward bias Reverse bias
+V -V -V +V

p n p n

n p n p

Bias Type Junction Polarities Junction Resistance


Forward n-type is more (-) than p-type Extremely low
Reverse p-type is more (-) than n-type Extremely high

29
A Final Note
Si is preferred to Ge:
• Si is more tolerant of heat.
• Germanium oxide is water soluble – make
it difficult to process.
• A Ge device allows more leakage current
than that of Si.

30
Summary
• Semiconductor valence shell.
• n-type and p-type doping.
• pn junction.
• Forward and reverse bias.
• Why Si is preferred to Ge.

31

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