VK1000 Datasheet
VK1000 Datasheet
VK-X Series
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Industry First
New Principle
Rapid 3D measurement
Focus Variation ISO 25178-6
New Algorithm
VK History
Since 1995
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Technology Comparison
Profilometers
Damage to surface Difficult to position stylus Stylus tip size limits resolution
Contact profiler
R: 2 µm
Interferometers
Data loss on steep angles Tilt adjustment required Poor spatial resolution
Sample placement
Focus adjustment
Tilting adjustment
Start measurement
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Laser Microscope Solutions
Non-Destructive Measurement
Laser Microscope
R: 0.2 µm
Sample placement
Start measurement
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Technology Comparison
Conventional
VK-X1000
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Industry First
VK-X1000
High Accuracy over a Large Area
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Technology Comparison
Rapid 3D measurements
As Little as
5 Seconds
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New Principles for Faster Measurement
Conventional
— Point-based scanning —
Approx. 60 seconds
VK-X1000
— Instant surface scanning —
Approx. 5 seconds
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Technology Comparison
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AI-SCAN Automates
the Measurement Process
AAG II Function Automatically Adjusts Intensity Double Scan Function for Improved
of Received Light Data Collection
Optimisation of the received laser intensity makes If a surface cannot be measured accurately with a
accurate measurement possible for targets with single scan, the sensitivity of the light-receiving
complex surfaces or those with large differences in element is automatically adjusted and the object is
reflectance. scanned again to generate accurate results.
Conventional Conventional
Conventional RPD II
Z position
Z position
RPD II
Intensity of reflected light Intensity of reflected light Intensity of reflected light Detected focal point
Detection of the true focal point is
possible.
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Accuracy
Conventional 16-bit
BGA (200×)
Accurate Measurement of Steep Angles with Measure Surfaces with Large Changes in
16× Dynamic Range Reflectance or Colour
With 16 times the dynamic range of conventional Utilising 16-bit (65,536-shade) processing, the VK-X is
systems, the VK-X provides accurate measurement for capable of distinguishing different colours and mixed
samples with steep angles or complicated shapes, as light and dark areas that proved difficult with
well as at low magnification. conventional systems.
87.1 degrees
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Accurate Nano-Level Measurements
All-new KEYENCE technology
MEMS actuator (1000×) Provided by Mita Laboratory, Graduate School of Engineering, University of Tokyo,
as part of the Nanotechnology Platform at the university’s VLSI Design and Education Center (VDEC)
Z X-Y
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Efficiency
Multi-line Roughness
Horizon 1
Ra Rz RSm
Laser + Optical 3D
Profiles Ave. Ave. Ave.
μm μm μm
Total profile
Sample A
Roughness profile
Total profile
Sample B
Roughness profile
Total profile
Sample C
Roughness profile
Total profile
Sample D
Roughness profile
By aligning the height range scales, the VK-X is able to perform measurement for multiple data
sources under identical conditions. Differences due to changes in manufacturing conditions or
wear over time can be instantly recognised for drastically reduced analysis time.
Position alignment,
image processing,
and measurement
unification
Collective height
display setting
Collective graph
display setting
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Fully Automated, Programmable Inspections
Programming and batch measurement
Using an advanced motorised stage, images and measurements can be taken at programmed locations, increasing the number of test
samples that can be evaluated and completely automating the inspection process.
Total
Max.
Min.
Ave.
Std. DV
3 Sigma
Volume C.S. area Surface area Surface area/C.S. area Area ratio Average height Max. height Perimeter Horz. Feret Vert. Feret Circle equivalent dia
Total
Max.
Min.
Ave.
Std. DV
3 Sigma
Volume C.S. area Surface area Surface area/C.S. area Area ratio Average height Max. height Perimeter Horz. Feret Vert. Feret Circle equivalent dia
Total
Max.
Min.
Ave.
Std. DV
3 Sigma
Volume C.S. area Surface area Surface area/C.S. area Area ratio Average height Max. height Perimeter Horz. Feret Vert. Feret Circle equivalent dia
Total
Max.
Min.
Ave.
Std. DV
3 Sigma
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Analytics
Facets on GaAs due to liquid phase growth (3000×) Provided by Prof. Tadaaki Kaneko, Department of Chemistry,
School of Science and Technology, Kwansei Gakuin University
By scanning an entire area, the VK-X can perform non-contact measurements anywhere on an
object, without the need to re-scan when other locations need to be measured.
Conventional Conventional
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Intuitive Roughness Analysis
Compliant with ISO standards-Evaluate roughness on any material
The VK-X is able to measure surface roughness (ISO 25178) and line roughness (ISO 4287) on
surfaces that have textures too small for normal stylus-based systems to measure. Users can get
a more detailed picture of how their surface looks and accurately quantify it as well.
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Quantification
Switch (400×)
Single and Multi Line Roughness Measurement Surface Roughness Measurement (ISO 25178)
(ISO 4287)
The VK-X utilises data from the overall surface to achieve
Roughness measurement for ISO-compliant shapes is ISO-based roughness measurements. Instead of using just a
possible with the VK-X. With a spot diameter of 0.4 µm, the line, roughness can be calculated over an area for more
laser light is able to accurately analyse even ultra-fine accurate and stable measurement.
shapes. The VK-X also features a contact-type roughness
measurement mode that can be used to determine
correlation with contact profilers.
Processed metal
surface (400×)
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Planar Measurements Film Thickness Measurement
Various XY measurements are possible including distance, The VK-X measures thickness by analysing the light reflected
circular diameter, and angle. The wide selection of functions from two locations of a transparent object—the top surface
helps to reduce variation through automatic extraction of and the bottom surface. The topmost and bottommost layers
target edges and the creation of auxiliary lines and of the film are converted to a 3D image, and the thickness is
intersections. measured from the image’s cross-sectional shape.
Plastic case
surface
Clear coated
Thickness of surface
clear coating
Plastic case
surface
Conventional
Cannot measure the top surface of
a transparent layer due to strong
reflection from the bottom layer.
VK-X
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Imaging
Advanced Observation
High-definition optical imaging system
KEYENCE’s microscope
technology has been cultivated
over many years and allows
anyone to capture clear images
easily.
Through-hole (70×) Colour sensor (200×) Chip resistor (100×)
After HDR processing Ink toner (400×) Depth composition Chip resistor (100×)
image
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High Magnification and Resolution
Comparable to an SEM
28,800× magnification without the need for a vacuum
Optical image
Click to move
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Measurement/Observation Principle
Short-wavelength
laser light source
Condensing lens
Half mirror
Pinhole
Light-receiving element
(photomultiplier)
Half mirror
White light source
Objective lens
Observation target
Short-wavelength 1024×768
laser light pixels
Measurement range
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Dual Light Sources
The VK-X uses two light sources: a laser light source and a white light source. Image and height data
are captured by using a high-speed scanner to raster the laser across the surface of the object.
The white light source enables the capture of colour information, similar to an optical microscope, while
the laser information provides much higher lateral resolution and measurement data.
Laser source: For the VK-X, two types of laser sources are available: 404 nm violet
semiconductor laser and 661 nm red semiconductor laser. The appropriate laser can be
selected based on the application.
Colour + laser intensity image Laser intensity image Height difference image
Detection of the peak (focal point) by means of the pinhole confocal optical system in comparison to
systems without a pinhole
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Optional Software
The Analysis Expansion Module is available for samples that require position compensation and for measuring angles of spheres and
planes. This module provides additional 3D measurement tools for improving analysis efficiency and flexibility.
Automatically counts the number of particles and measures the diameters, Particles can be counted and analysed based on
major and minor axes, area, area ratio, etc. on a surface. Processing, such accurate 3D surface data instead of just colour or
as circular shape separation, expansion, and erosion, can also be brightness. The results can be output to Excel or
performed automatically. other software for easy analysis or statistical
processing.
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Optional Stages and Lenses
An optional spacer extends the working distance of the VK by The high-accuracy, motorised XY stage enables more precise
an additional 100 mm so that taller objects can be navigation, programmable measurements, and image stitching
accommodated directly on the stage. capabilities.
100 mm spacer
Observe and analyse across an entire 300 mm wafer. The If requested, we can propose customised stages that can
stage itself can be attached directly to the VK with no measure larger samples (e.g. solar panel substrates).
alterations. Please contact KEYENCE for other sizes.
Ultra-long range
480× 20.5 mm
20× lens
Ultra-long range
1200× 13.8 mm
50× lens
Ultra-long range
2400× 4.7 mm
100× lens
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Application Examples
Fracture surface: Maximum height difference measurement (400×) Processed metal surface: Surface roughness comparison (400×)
Drill bit: Radius measurement (100×) Cutting tool: Wear analysis (100×)
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Precision Processing and Chemical
Film: Surface roughness measurement (3000×) Light guide panel: Area and volume measurement (3000×)
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Application Examples
Inductor: Sectional measurement Provided by Mita Laboratory, Graduate School of Engineering, PCB (42×, image stitching)
(1000×) University of Tokyo, VLSI Design and Education Center (VDEC) (P5)
Wafer backside: Roughness measurement (1000×) MEMS: Sectional Provided by Dr. Matthieu Denoual (GREYC/CNRS, ENSI de Caen, France) and Mita
measurement (1000×) Laboratory, Graduate School of Engineering, University of Tokyo, VLSI Design and
Education Center (VDEC) (Front)
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Others
Paper surface: Degree of flatness measurement (100×) Clock movement (100×, image stitching)
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System Lineup
16-bit 3D Laser Scanning Confocal Microscope 16-bit 3D Laser Scanning Confocal Microscope
Controller VK-X1000 Controller VK-X1000
Head VK-X1100 Head VK-X1050
Stage (motorised/manual) Stage (motorised/manual)
VK-D1/VK-S1 VK-D1/VK-S1
Motorised XY stage:
VK-S2100
Stage for 300 mm wafers:
OP-88231 (optional) Motorised stage: VK-D1 VK-X1100 VK-X1000
Extended height spacer:
OP-88232 (optional)
Ring illumination for 2.5× lens:
OP-88230 (optional)
VK reference gauge:
OP-88248 (optional)
Extension cable set: Manual stage: VK-S1 VK-X1050 Control PC Monitor (optional)
OP-88249 (optional)
* Please contact KEYENCE for a Observation/analysis software set: VK-H2X Particle analysis module: VK-H1XG (optional)
stage suitable for large-sized
samples. Image stitching module: ISO 25178 Surface texture measurement module:
VK-H2J (optional) VK-H1XR (optional)
Analysis expansion module:
VK-H1XP (optional)
Dimensions
Unit: mm
213
X1050
195
84
80
62
39
98
71
52.5
24.5
38
92.5
88
112 116 Hatching
installation
surface
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30
77
77
307 45 307 45
192 ø75 218 192 ø75 218
348 428 48 348 428 48
526
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Specifications
Basic Functions
Model (controller/head unit) VK-X1000/X1100 VK-X1000/X1050
Total magnification*1 Up to 28,800×
Field of view (minimum range) 11 µm to 7398 µm
Frame rate*2 (laser measurement speed) 4 to 125 Hz, 7900 Hz
Optical system Pinhole confocal optical system, Focus variation
Measurement Light-receiving element 16-bit photomultiplier: High-definition colour CMOS
principle Scanning method (during general Automatic upper/lower limit setting, high-speed light intensity optimisation (AAG II),
measurement and image stitching) poor reflected light intensity supplement (Double Scan)
Display resolution 0.5 nm 5 nm
Linear scale 0.5 nm 5 nm
Dynamic range 16 bits
Height measurement Laser confocal 20× 40 nm, 50× 12 nm 20× 40 nm, 50× 20 nm
Repeatability σ
Focus variation 5× 500 nm, 10× 100 nm, 20× 50 nm, 50× 20 nm 5× 500 nm, 10× 100 nm, 20× 50 nm, 50× 30 nm
Height data acquisition range 700,000 steps
Accuracy*3 0.2+L/100 µm or less (L= Measuring length)
Display resolution 1 nm 10 nm
Laser confocal 20× 100 nm, 50× 40 nm 20× 100 nm, 50× 50 nm
Width measurement Repeatability 3σ
Focus variation 5× 400 nm, 10× 400 nm, 20× 120 nm, 50× 50 nm 5× 400 nm, 10× 400 nm, 20× 120 nm, 50× 65 nm
Accuracy*3 Measured value ±2% or less
XY stage Manual: Operating range 70 mm × 70 mm
configuration Motorised: Operating range 100 mm × 100 mm
High-resolution colour CMOS image
16-bit laser colour confocal image
Observation image
Observation Confocal + ND filter optical system
C-laser differential interference image
Lighting Ring illumination, coaxial illumination
Wavelength Violet semiconductor laser, 404 nm Red semiconductor laser, 661 nm
Measurement laser
Maximum output 1 mW
light source
Laser class Class 2 laser product (IEC60825-1)
Power voltage 100 to 240 VAC, 50/60 Hz
Power supply
Power consumption 150 VA
Measurement head Approx. 13.0 kg
Weight Stage Approx. 16.0 kg (+2.5 kg with motorised stage attached)
Controller Approx. 3.0 kg
*1 When using a 23 inch full-screen display.
*2 At top speed when using a combination of measurement mode/measurement quality/lens magnification. When the line scan has a measurement pitch that is within 0.1 μm.
*3 When measuring a standard sample (standard scale) with a 20× or greater lens.
Measuring Lenses
W/D
Objective lens Field of view VK-X1100 VK-X1050
(mm)
2.5× 8.8 675 × 506 µm to 7398 × 5545 µm Optional Optional
5× 22.5 337 × 253 µm to 3699 × 2773 µm P P
10× 16.5 168 × 126 µm to 1849 × 1386 µm P P
20× 3.1 84 × 63 µm to 924 × 693 µm P P
50× 0.54 33.7 × 25.2 µm to 370 × 277 µm N/A P
100× 0.35 16.8 × 12.6 µm to 185 × 138 µm N/A Optional
APO, 50× 0.35 33.7 × 25.2 µm to 370 × 277 µm P Optional
APO, 100× 0.32 16.8 × 12.6 µm to 185 × 138 µm Optional Optional
APO, 150× 0.2 11 × 8.3 µm to 123 × 92 µm Optional Optional
Long range, 20× 11.0 84 × 63 µm to 924 × 693 µm Optional Optional
Long range, 50× 8.7 33.7 × 25.2 µm to 370 × 277 µm Optional Optional
Long range, 100× 2 16.8 × 12.6 µm to 185 × 138 µm Optional Optional
Ultra-long range, 20× 20.5 84 × 63 µm to 924 × 693 µm Optional Optional
Ultra-long range, 50× 13.8 33.7 × 25.2 µm to 370 × 277 µm Optional Optional
Ultra-long range, 100× 4.7 16.8 × 12.6 µm to 185 × 138 µm Optional Optional
Lens replacement Can be replaced by the user
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In-Depth Analysis of Roughness
Introduction to roughness
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