mos
mos
3.4 MOS
Mos transistors are built on a p-type substrate of moderate doping. Source
and drain are formed by diffusing heavily doped n-type impurities (n+)adjacent to
the gate. A layer of silicon dioxide (SiO 2) or glass is place over the substrate in
between the source and drain. Over SiO2, a layer of polycrystalline silicon or
polysilicon is formed, from which the gate terminal is taken.
The following figure shows the structure and symbol of nMOS transistor.R
1. Accumulation mode
2. Depletion mode
3. Inversion mode
a. Accumulation Mode
In this mode a low positive voltage is applied to the gate. This results in
some positive charge on the gate. The holes in the body are repelled from the
region directly beneath the gate.
c. Inversion Mode:
the gate. This conductive layer of electrons in the p-type body is called the inversion
layer.
In this region Vgs < Vt .The source and drain have free electrons. The body has
free holes but no free electrons. The junction between the body and the source or drain
is reverse biased. So no current will flow. This mode of operation is called cut-off.
Linear region:-
In this region Vgs >Vt .Now an inversion region of electrons called the channel
connects the source and drain. This creates a conductive path between source and
drain. The number of carriers and the conductivity increases with the gate voltage.
The potential difference between drain and source is V ds =V gs – Vgd. If V
ds=0,there is no electric field tending to push current from drain to source.
b. Saturation region:-
In this region Vds becomes sufficiently larger than V gd < Vt, the channel is no
longer inverted near the drain and becomes pinched off .Above this drain voltage, the
I ds is controlled only by the gate voltage. This mode is called saturation mode.