Reliability_testing_of_VCSELs_Transceivers_and_ASICs
Reliability_testing_of_VCSELs_Transceivers_and_ASICs
2 years
Cumulative Percentage Failed (%)
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0.5 Cu r
DBR
Defects at edge of Oxide
DBR active MQW region
Oxide
MQW
Analysis by EAG
Tony Weidberg Opto mini workshop March '14 4
More Controlled Tests
• Aged VCSEL array in 70C/85% RH with
regular power measurements and EL
imaging.
• Stopped as soon as significant
decrease in power detected.
• EL image shows 4% of area is dark.
• Subsequent TEM analysis (next
slides).
Zoom
Tony Weidberg Opto mini workshop March '14 6
X-Section TEM
• X-section views
– after thinning to ~ 1.8
um (“thick”).
AOC TX in
T correction fit Bat 161
14
T (°C)
AOC TX in Bat 161 Steve McMahon
15
Time (days)
Optical Power (mV) AOC in SR1 Steve McMahon
16
Time (days)
VCSEL Testing Plans
• Standard damp heat tests
– 1000 hours, 85C/85% RH.
– Drive current 10 mA dc
– Measure optical power continuously.
– Aim for much higher statistics than we have done
in the past learn about infant mortality and
random failure rates as well as lifetime.
– So far we have tested 2 VCSELs, would like to do
200 devices?
• Have equipment to do batches of 80 devices.
VTRx
FPGA Optical
Switches Optical Power
VTRx attenuator Meter
Loopback tests
Optical switches allow many VTRx to be tested in
an environmental chamber.
Valencia Feb 2014 Tony Weidberg 21
BER Scans
• Measure BER vs OMA
(optical modulation
amplitude).
• Define minimum OMA
to achieve BER = 10-12.
• Measure this during
continuous operation
at elevated
temperature.
• Curves show example
BER scans with and
w/o beam.
23
Why worry?
• Traditionally failures in HEP not dominated
by ASIC reliability
– Connectors, solder, wire bonds, cracks in tracks
and vias, capacitors, power supplies
– Non-ideal scaling in DSM processes
• Aggressive designs target optimal performance
• Voltage decreases insufficient to compensate density
increase higher T lower reliability.
24
FA Webinar- Cheryl Tulkoff
(slide from J. Bernstein)
25
ASIC Reliability
• Lifetime tests at different T ( low and high)
and elevated V
• Fit model parameters extrapolate MTTF to
use case (see backup slides for details).
• Start with ATLAS pixel FE-I4
• Test GBTx when large numbers available
29
Chip Reliability
• What is there to worry about?
• Failure Mechanisms
• Statistical analysis PoF
• Plans for testing GBTx (similar study for
ABC130).
30
Why worry?
• Traditionally failures in HEP not dominated
by ASIC reliability
– Connectors, solder, wire bonds, cracks in tracks
and vias, capacitors, power supplies
– Non-ideal scaling in DSM processes
• Aggressive designs target optimal performance
• Voltage decreases insufficient to compensate density
increase higher T lower reliability.
31
FA Webinar- Cheryl Tulkoff
(slide from J. Bernstein)
32
Physics of Failure (PoF)
• Assumption of single dominant damage
mechanism can lead to wrong extrapolation of
lifetimes from accelerated tests.
• PoF aims to understand different failure
mechanisms
– Fit model parameters to data for each damage
mechanism
– Combine results to predict reliability at operating
conditions
– Health warning: competing models for some damage
mechanisms can give very different extrapolations to
operating conditions.
33
Time Dependent Dielectric
Breakdown (TDDB)
Holes injected into
• In DSM processes E fields over oxide Stress
gate oxides ~ 5 MV/cm cf Induced leakage
currents by
breakdown fields of > ~ 10
tunnelling
MV/cm. breakdown
– Gradual degradation later failures
• Acceleration model
– Mean Time to Failure (MTTF)
– MTTF=A×10-βE exp(-Ea/kT)
– Example fits look ok but activation
energy not constant? next slide
– can’t fit to single failure mechanism!
34
TDDB Fits
• Fits to Voltage (E field)
and T look ok but
MTTF
estimated value of Ea vs E
depends on E ?
Fitted Ea not constant!
MTTF
vs 1/T
35
Hot Carrier Injection (HCI)
• Non-ideal scaling larger E fields “hot”
carriers can overcome barrier between Si and
gate oxide
– Trapped charges lead to changes in VTh and gm
– Eventually lead to failure
– t = c (Isub)-m
– T dependence because at low T electron mfp
longer acquire more energy in E field
impact ionization.
36
HCI
• Shift Min Vcc
• Example fits to
threshold shifts.
• Typical fit values
– m~3
• Also need to consider T
variation.
37
Electro-migration (EM)
• High current densities, force exerted by electrons large enough to
cause diffusion of metal ions in the direction of the e flow.
– Creates voids increases R thermal runaway open circuit
– Excess build up of ions at the anode can give short circuit
• Very sensitive to material, doping, grain boundaries etc…
• EM is thermally activated, T gradients flux divergences.
• Best model MTTF A( j e ) n exp( Ea / kT )
38
Other Mechanisms
• NBTI (Negative Bias Temperature Instability)
– Degradation (Vth/Gm shift) occurring due to
negative biased BT (bias temperature) stress in
PMOS FETs
• Stress migration
– CTE mismatch can cause stress even with no
current.
• Assembly & packaging
39
Combining Failure Rates
• Common method is just to assume exponential
distributions
– Total failure rate: TOTAL i i
– But we know that failure distributions aren’t exponential !
• Failure distributions better modelled by Weibull or log-
normal distributions.
• Finally we don’t actually want MTTF we need MTT01
(1% failure) or MTT10 (10% failure).
– Need to combine distributions correctly from different
failure mechanisms.
– Determine MTT0X numerically
40
Weibull Distribution (from Wiki)
1
m x ( x / )m
f ( x ; m, ) e
• Commonly used distribution in reliability theory
• m < 1 indicates that the failure rate decreases
over time significant “infant mortality”.
• m = 1 failure rate is constant over time, i.e.
random failure.
• m > 1 failure rate increases with time. This
happens if there is an "aging" process
Compare Distributions
• Compare exponential, Weibull and log-normal
• Note Weibull and log normal totally different from
exponential for small x
– This is just the region we are interested in!
0.6
0.5
0.4
exp(-x)
0.3 Weibull
0.2 log normal
0.1
0
0 1 2 3 4 5 6 42
Example Weibull Distributions
2
1.8
1.6
1.4
1.2 m=2
m=10
1
0.8
0.6
0.4
0.2
0
0 1 2 3 4 5 6
Measuring MTTF
• How well can we determine MTTF in an AL
(Accelerated Lifetime) test? Depends on
– Sample size
– Weibull shape parameter n.
• Example Fits Sample size % error t_m
10 18.9
– Assume n=2 (pessimistic) 30 10.0
50 8.2
45
Determining (V,T) Grid
• Use case assumed: V=1.2V, T=20C.
• Assumed 3 damage mechanisms have equal rates at
use condition (pessimistic)
• (V,T) Matrix designed to determine model
parameters with minimum number of tests.
– EM: Temp values 85 95 110
– TDDB: Voltage values: 1.5 1.6 1.7
– HCI: Temp ©
C
Voltage -20 -10 0
1.55 x
1.5 x x x
1.45 x
46
(V,T) Grid
• Simplify analysis
– Can we factorise different damage mechanisms in fits?
– Look at purity
EM TDDB HCI
– Not perfect?
88.3 11.7 0.0
0.0 95.1 4.9
0.0 11.6 88.4
– Acceleration rates:
• high so that tests last not longer than ~1000 hours
• Not too high so that other mechanisms are dominant and
extrapolation to use case is too large.
• AF in range 103 to 2 105.
47
Errors on Acceleration Factors from Fits
% error MTTF % error AF
• EM fits for Ea in 2
4
7.5
15.0
8 12.7
exp(- Ea /kT) 10 30.8
20 95.8
49
Practical issues
• Can we use this (V,T) range (TBD with Paulo).
• Need minimum 11 grid points and between 10 and 30
chips per point.
• Also need to do quick tests with fewer chips to determine
centres of the grids.
– Check that MTTF is in reasonable range (1 to 1000 hours).
• Number of chips required in range 150 to 400.
• Use several environmental chambers
– Combine tests at same T but different V conditions need
between 3 and 7 environmental chambers depending if all
tests are done in parallel or some in series.
– Hope to find new collaborators …
50
References
• Bernstein, Physics of Failure Based Handbook
of Microelectronic Systems, RIAC.
• Srinivasaan et al, The impact of Technology
Scaling on Lifetime Reliability, DSN-04.
• Semiconductor Reliability Handbook,
www.renesas-electoronics.com
51
LTx in SR1
• LTx optical power.
• No T correction
• Initial decrease
~1%.
– No burn-in
preformed for
this array
probably ok but
should run longer
52
53
Accelerated Aging Tests
• Measure Mean Time To Failure at several elevated
temperature/current and RH use Arrehnius
equation for Acceleration Factor from (I2,T2) to
(I1,T1) Activation energy: EA and exponential for
relative humidity (RH).
EA
exp
I2 2
AF ( ) k BT2 AF exp(a * RH )
I1 EA
exp
k BT1
• All taken with same SEM settings: 10KV spot 5 (roughly same mag 4700X and 5000x)
• Original Image LUTs stretched to accentuate EBIC changes across VCSELs
• Only Ch 10 shows distinct EBIC minima (dark spots) within the emission region
• Ch 06 & 08 show some inhomogeneity but no distinct minima
• Small dark speckles are surface topography
Top DBR
oxide
MQW
(active region)
Bottom
DBR
Analysis by EAG
Tony Weidberg Opto mini workshop March '14 58
Example Spectra
• Air ~ 50% RH • Dry N2
– Loss of higher order – Higher order modes
modes visible very similar