Unit I
Unit I
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Arbaminch University
Power Electronics is the art of converting electrical energy from one form
to another in an efficient, clean, compact, and robust manner for convenient
utilization.
The utilization of the Bipolar junction transistor, Fig. 1.2 in the two types of
amplifiers best symbolizes the difference. In Power Electronics all devices are
operated in the switching mode - either 'FULLY-ON' or 'FULLY-OFF' states. The
linear amplifier concentrates on fidelity in signal amplification, requiring
transistors to operate strictly in the linear (active) zone, Fig 1.3. Saturation and
cutoff zones in the VCE - IC plane are avoided. In a Power electronic switching
amplifier, only those areas in the VCE - IC plane which have been skirted above,
are suitable. On-state dissipation is minimum if the device is in saturation (or
quasi-saturation for optimizing other losses). In the off-state also, losses are
minimum if the BJT is reverse biased. A BJT switch will try to traverse the active
zone as fast as possible to minimize switching losses
Fig.Typical Bipolar transistor based (a) linear (common emitter) (voltage) amplifier stage and
(b) switching (power) amplifier
History
Power electronics and converters utilizing them made a head start when
the first device the Silicon Controlled Rectifier was proposed by Bell Labs and
commercially produced by General Electric in the earlier fifties. The Mercury Arc
Rectifiers were well in use by that time and the robust and compact SCR first
started replacing it in the rectifiers and cycloconverters. The necessity arose of
extending the application of the SCR beyond the line-commutated mode of
action, which called for external measures to circumvent its turn-off incapability
via its control terminals. Various turn-off schemes were proposed and their
classification was suggested but it became increasingly obvious that a device
with turn-off capability was desirable, which would permit it a wider
application. The turn-off networks and aids were impractical at higher powers.
The range of power devices thus developed over the last few decades can be
represented as a tree,
Power Diodes of largest power rating are required to conduct several kilo
amps of current in the forward direction with very little power loss while
blocking several kilo volts in the reverse direction. Large blocking voltage
requires wide depletion layer in order to restrict the maximum electric field
strength below the “impact ionization” level. Space charge density in the
depletion layer should also be low in order to yield a wide depletion layer for a
given maximum Electric fields strength. These two requirements will be satisfied
in a lightly doped p-n junction diode of sufficient width to accommodate the
required depletion layer. Such a construction, however, will result in a device
with high resistively in the forward direction. Consequently, the power loss at
the required rated current will be unacceptably high.
On the other hand if forward resistance (and hence power loss) is reduced
by increasing the doping level, reverse break down voltage will reduce. This
apparent contradiction in the requirements of a power diode is resolved by
introducing a lightly doped “drift layer” of required thickness between two
heavily doped p and n layers. The Figure shows the circuit symbol and the
photograph of a typical power diode respectively
Fig. Diagram of a power; (a) circuit symbol (b) photograph; (c) schematic cross
section.
Under reverse bias condition only a small leakage current (less than
100mA for a rated forward current in excess of 1000A) flows in the reverse
direction (i.e from cathode to anode). This reverse current is independent of the
applied reverse voltage but highly sensitive to junction temperature variation.
When the applied reverse voltage reaches the break down voltage, reverse
current increases very rapidly due to impact ionization and consequent
avalanche multiplication process. Voltage across the device dose not increase any
further while the reverse current is limited by the external circuit. Excessive
power loss and consequent increase in the junction temperature due to continued
operation in the reverse brake down region quickly destroies the diode.
Therefore, continued operation in the reverse break down region should be
avoided.
p and n type carriers defuse and recombine inside the drift region. If the
width of the drift region is less than the diffusion length of carries the spatial
distribution of excess carrier density in the drift region will be fairly flat and
several orders of magnitude higher than the thermal equilibrium carrier density
of this region. Conductivity of the drift region will be greatly enhanced as a
consequence (also called conductivity modulation).
The voltage dropt across a forward conducting power diode has two
components Vak = Vj + VRD
+ -
Where Vj is the drop across the p n for a given forward current jF. The
component VRD is due to ohmic drop mostly in the drift region. The ohmic drop
makes the forward i-v characteristic of a power diode more linear.
Power Diodes take finite time to make transition from reverse bias to
forward bias condition (switch ON) and vice versa (switch OFF). Behavior of the
diode current and voltage during these switching periods are important due to
the following reasons.
• Severe over voltage / over current may be caused by a diode switching at
different points in the circuit using the diode.
• Voltage and current exist simultaneously during switching operation of a
diode. Therefore, every switching of the diode is associated with some
energy loss. At high switching frequency this may contribute significantly
to the overall power loss in the diode.
Fig: Forward current and voltage waveforms of a power diode during Turn On
and Turn Off operation.
Observed Turn OFF behavior of a Power Diode: Figure shows a typical turn off
behavior of a power diode assuming controlled rate of decrease of the forward
current.
short circuit across the supply, current being limited only by the stray
wiring inductance. Also in high frequency switching circuits (e.g, SMPS) if
the time period t4 is comparable to switching cycle qualitative modification
to the circuit behavior is possible.
Silicon Controlled Rectifier (SCR)
Fig. : Constructional features of a thysistor (a) Circuit Symbol, (b) Photograph (c)
Schematic Construction.
-
The primary crystal is of lightly doped n type on either side of which two
p type layers with doping levels higher by two orders of magnitude are grown.
As in the case of power diodes and transistors depletion layer spreads mainly
-
into the lightly doped n region. The thickness of this layer is therefore
determined by the required blocking voltage of the device. However, due to
conductivity modulation by carriers from the heavily doped p regions on both
+
side during ON condition the “ON state” voltage drop is less. The outer n layers
are formed with doping levels higher then both the p type layers. The top p layer
+
acls as the “Anode” terminal while the bottom n layers acts as the “Cathode”.
Dr.M.Sundarrajan/Associate Professor Page 9
Power Electronics 2019
The “Gate” terminal connections are made to the bottom p layer. As it will be
shown later, that for better switching performance it is required to maximize the
peripheral contact area of the gate and the cathode regions. Therefore, the
cathode regions are finely distributed between gate contacts of the p type layer.
An “Involute” structure for both the gate and the cathode regions is a preferred
design structure.
Voltage ratings
Peak Working Forward OFF state voltage (VDWM): It specifics the maximum
forward (i.e, anode positive with respect to the cathode) blocking state voltage
that a thyristor can withstand during working. It is useful for calculating the
maximum RMS voltage of the ac network in which the thyristor can be used. A
margin for 10% increase in the ac network voltage should be considered during
calculation.
Peak repetitive off state forward voltage (VDRM): It refers to the peak forward
transient voltage that a thyristor can block repeatedly in the OFF state. This
rating is specified at a maximum allowable junction temperature with gate
circuit open or with a specified biasing resistance between gate and cathode. This
type of repetitive transient voltage may appear across a thyristor due to
“commutation” of other thyristors or diodes in a converter circuit.
Peak non-repetitive off state forward voltage (VDSM): It refers to the allowable
peak value of the forward transient voltage that does not repeat. This type of
over voltage may be caused due to switching operation (i.e, circuit breaker
Peak working reverse voltage (VDWM): It is the maximum reverse voltage (i.e,
anode negative with respect to cathode) that a thyristor can with stand
continuously. Normally, it is equal to the peak negative value of the ac supply
voltage.
Peak repetitive reverse voltage (VRRM): It specifies the peak reverse transient
voltage that may occur repeatedly during reverse bias condition of the thyristor
at the maximum junction temperature.
Peak non-repetitive reverse voltage (VRSM): It represents the peak value of the
reverse transient voltage that does not repeat. Its value is about 130% of VRRM.
However, VRSM is less than reverse break down voltage VBRR.
Current ratings
Maximum RMS current (Irms): Heating of the resistive elements of a thyristor
such as metallic joints, leads and interfaces depends on the forward RMS current
Irms. RMS current rating is used as an upper limit for dc as well as pulsed current
waveforms. This limit should not be exceeded on a continuous basis.
Maximum average current (Iav): It is the maximum allowable average value of
the forward current such that
i. Peak junction temperature is not exceeded
ii. RMS current limit is not exceeded
TRIAC
The Triac is a member of the thyristor family. But unlike a thyristor which
conducts only in one direction (from anode to cathode) a triac can conduct in
both directions. Thus a triac is similar to two back to back (anti parallel)
connected thyristosr but with only three terminals. As in the case of a thyristor,
the conduction of a triac is initiated by injecting a current pulse into the gate
terminal. The gate looses control over conduction once the triac is turned on. The
triac turns off only when the current through the main terminals become zero.
The triggering sensitivity is highest with the combinations 1 and 3 and are
generally used. However, for bidirectional control and uniforms gate trigger
mode sometimes trigger modes 2 and 3 are used. Trigger mode 4 is usually
averred.
Characteristics of TRIAC
st rd
The V-I characteristics of Triac in the 1 and 3
quadrant of the V-I plane will be similar to the forward characteristics of a
thyristors, with no signal to the gate the triac will block both half cycle of the
applied ac voltage provided its peak value is lower than the break over voltage
(VBO) of the device. However, the turning on of the triac can be controlled by
applying the gate trigger pulse at the desired instance. Mode-1 triggering is used
in the first quadrant where as Mode-3 triggering is used in the third quadrant. As
such, most of the thyristor characteristics apply to the triac (ie, latching and
holding current). However, in a triac the two conducting paths (from MT1 to MT2
or from MT1 to MT1) interact with each other in the structure of the triac.
Therefore, the voltage, current and frequency ratings of triacs are considerably
lower than thyristors. At present triacs with voltage and current ratings of 1200V
and 300A (rms) are available. Triacs also have a larger on state voltage drop
compared to a thyristor.
There is no path for any current to flow between the source and the
drain terminals since at least one of the p n junctions (source – body and body-
Drain) will be reverse biased for either polarity of the applied voltage between
the source and the drain. There is no possibility of current injection from the gate
terminal either since the gate oxide is a very good insulator. However,
application of a positive voltage at the gate terminal with respect to the source
will covert the silicon surface beneath the gate oxide into an n type layer or
“channel”, thus connecting the Source to the Drain The gate region of a MOSFET
which is composed of the gate metallization, the gate (silicon) oxide layer and the
p-body silicon forms a high quality capacitor. When a small voltage is
application to this capacitor structure with gate terminal positive with respect to
the source (note that body and source are shorted) a depletion region forms at
the interface between the SiO2 and the silicon The positive charge induced on the
gate metallization repels the majority hole carriers from the interface region
between the gate oxide and the p type body. This exposes the negatively charged
acceptors and a depletion region is created. As VGS increases further the density
of free electrons at the interface becomes equal to the free hole density in the bulk
of the body region beyond the depletion layer. The layer of free electrons at the
interface is called the inversion layer The inversion layer has all the properties of
an n type semiconductor and is a conductive path or “channel” between the
drain and the source which permits flow of current between the drain and the
source. Since current conduction in this device takes place through an n- type
“channel” created by the electric field due to gate source voltage it is called
“Enhancement type n-channel MOSFET”. The inversion layer screens the
depletion layer adjacent to it from increasing VGS. The depletion layer thickness
now remains constant.
VI Characteristics of GTO
The major difference with the corresponding MOSFET cell structure lies in
the addition of a p+ injecting layer. This layer forms a pn junction with the drain
layer and injects minority carriers into it. The n type drain layer itself may have
two different doping levels. The lightly doped n- region is called the drain drift
region. Doping level and width of this layer sets the forward blocking voltage
(determined by the reverse break down voltage of J2) of the device. The IGBT cell
has a parasitic p-n-p-n thyristor structure embedded into it. The constituent p-n-
p transistor, n-p-n transistor and the driver MOSFET are shown by dotted lines
in this figure. Important resistances in the current flow path are also indicated.
Gate The top p-n-p transistor is formed by the p+ injecting layer as the emitter,
the n type drain layer as the base and the p type body layer as the collector. The
lower n-p-n transistor has the n+ type source, the p type body and the n type
drain as the emitter, base and collector respectively. The base of the lower n-p-n
transistor is shorted to the emitter by the emitter metallization. However, due to
imperfect shorting, the exact equivalent circuit of the IGBT includes the body
spreading resistance between the base and the emitter of the lower n-p-n
transistor. If the output current is large enough, the voltage drop across this
resistance may forward bias the lower n-p-n transistor and initiate the latch up
process of the p-n-p-n thyristor structure. Once this structure latches up the gate
control of IGBT is lost and the device is destroyed due to excessive power loss.
A major effort in the development of IGBT has been towards prevention
of latch up of the parasitic thyristor. This has been achieved by modifying the
doping level and physical geometry of the body region. The modern IGBT is
latch-up proof for all practical purpose.
Characteristics of IGBT
When the gate emitter voltage is below the threshold voltage only a very
small leakage current flows though the device while the collector – emitter
Dr.M.Sundarrajan/Associate Professor Page 21
Power Electronics 2019
voltage almost equals the supply voltage (point C in Fig 7.4(a)). The device,
under this condition is said to be operating in the cut off region. The maximum
forward voltage the device can withstand in this mode is determined by the
avalanche break down voltage of the body – drain p-n junction. Unlike a BJT,
however, this break down voltage is independent of the collector current. IGBTs
of Non-punch through design can block a maximum reverse voltage (VRM) equal
to VCES in the cut off mode. However, for Punch through IGBTs VRM is negligible
(only a few tens of volts) due the presence of the heavily doped n+ drain buffer
layer. As the gate emitter voltage increases beyond the threshold voltage the
IGBT enters into the active region of operation. In this mode, the collector current
ic is determined by the transfer characteristics of the device. This characteristic is
qualitatively similar to that of a power MOSFET and is reasonably linear over
most of the collector current range. The ratio of ic to (VgE – vgE(th)) is called the
forward transconductance (gfs) of the device and is an important parameter in the
gate drive circuit design. The collector emitter voltage, on the other hand, is
determined by the external load line