Detectors Post
Detectors Post
Chapter 4
OPTICAL DETECTORS
(Reference: Optical Electronics in Modern Communications, A. Yariv, Oxford, 1977, Ch. 11.)
D1 D3 D5 D7
A
h
D2 D4 D6 D8
C
– HV
~2 KV
30%
20%
10%
(nm)
200 400 600 800 1000
Sensitivity:
For 10 dynodes, = 5 G = 5 10 10 7 .
Take 2eV photons (620 nm), 1 picoW = 1012W = 1012J/s
– Thermal excitation rate is proportional to , where represents the cathode work func-
tion
so lower work function IR sensitivity, but larger dark current
– For room temperature, typical cathode dark current, I cd , is 10 4 electrons/sec. Anode dark current
is then
– Dark current sets a lower limit to phototube sensitivity to low light levels. To distinguish a light sig-
nal above the background dark current, the photoelectric cathode current must exceed the dark cur-
rent. If I cd is 10 4 e/sec , then the sensitivity to light can be 3 10 4 photons/sec (assuming QE =
30%). 3 10 4 red photons/s 1014 W!
– Dark current can be reduced by cooling. Using thermoelectric cooling T – 40C is easily obtained.
Assume a work function of = 1.5 eV
C
R = 50
2V discriminator output
is a digital pulse
t
– How big is the PMT output pulse from one photon? For G 10 7 , we get 10 7 electrons 10 –12 C . For
p = 10 – 8 sec, I apk 10 – 4 A . For R = 50 , V p 5 mV .
– Discriminator eliminates electrical noise in < 1mV range. V p has a variation due to statistical nature
of gain process. Discriminator also eliminates this.
Shot noise: Photon arrival is always statistical. Generally it follows Poisson statistics. Then if the
photon arrival rate is N ph/sec , and we count for 1 sec, we get N on average. The standard devia-
tion will be found to be N . This means we have noise.
Ncounts N
sec
1 2 3 4 5 6 7
Shot noise is universal for light detection. Even if photons are not explicitly counted, the shot
noise is a fundamental limit. It is most significant at low light levels, though, due to N depen-
dence.
Johnson noise: Random thermal noise in any resistor, R
4kT
I RMS = --------- B V RMS = 4kTRB
R
2 electron cascade
– HV
1. Photon hits funnel portion
2. Electrons are accelerated into the bent tube by bias field
3. Secondary electron emission gives gain at each electron collision with wall
4. Must be operated in vacuum
5. Typical gain 10 4
6. More compact and rugged than PMT
10-20m separation
each hole ~5-10m diameter
Anode
h
A
gain ~106 HV ~1-2KV
HV
light
e
eye or video camera
HV
Semiconductor Photodetectors
• Seimiconductor band structure
electrons doping
EC
EF
EG
EF
EV
holes
n-type p-type
• Optical absorption across the bandgap
If h E G , an electron and hole (pair) is created
EC after photon absorption.
h In a suitable structure, the electron and the hole
EV can contribute to an electric current through the
device.
• p-n Junction
N = ND – NA
ND
z
–NA
V bi equilibrium
z
EF
• Depletion approximation: Assumes carriers diffuse across junction and create regions that are totally
devoid of free carriers
– lp 0
z
ln
• Reverse bias
E
Photodiode
Reverse bias condition: electron and hole created in the depletion region follow the electric field and sep-
arate.
h
V
The electric field exists only inside the depletion region. So the light absorption must also occur there to
create current.
Construction
thin electrode passes light
thin, heavily doped n+ layer
depletion region
lightly doped p-region
backside electrode
• Photodiodes can be used at longer wavelength than photomultiplier – E G
• Typically fast response time < 10 nsec
• Compact, inexpensive
p-i-n photodiode
p i n
NP
Solar cells
(Reference: Solar electricity, 2nd edition, Tomas Markvart, ed., John Wiley, 2000)
I0
Solar radiation -
AM 1.5 - on a clear day, the typical maximum solar irradiance is ~1kW/m2 or 100 mW/cm2, which
translates to ~4.4X1017 photons/cm2-sec.
In principle, when absorbed, this photon flux could produce a ‘generation current’ of
where N is the number of photons absorbed per second, and A is the area that is exposed to light. For
the entire solar spectrum, this corresponds to about 70mA/cm2. The band gap for crystalline silicon is
1.1 eV, so only the part of the spectrum shown above that is shaded in black can be absorbed. Thus,
for silicon, the maximum generation current is about 44 mA/cm2.
Direct vs. indirect gap
Some semiconductors are good absorbers, and absorb all above-bandgap light in a layer of a few
microns thick. These are called direct-bandgap semiconductors. In others, called indirect-gap semi-
conductors, which include crystalline silicon, the absorption process is weaker. In this case, a phonon
(a quantum of the lattice vibration) is necessary to conserve momentum in the light absorption pro-
cess. In silicon, a layer several hundred microns thick is required.
bus bar
fingers finger
anti-reflection
coating
p-type base n-type emitter
backside contact
The top contact structure typically consists of widely spaced thin metal strips to allow the light to pass
through, with a larger bus bar connecting them all to extract the current. An anti-reflection coating on
top of the cell can be used to minimize reflection loss from the top surface.
The light generation current in the diode is in the reverse direction, so we can write to total current as
the difference between the two:
V
dark Voc open-circuit
Il voltage
Isc short-circuit
current
under illumination
I Pmax
Im sc
V
Vm Voc
The efficiency of a solar cell, , is defined as Pmax produced by the cell under standard test condi-
tions, divided by the power of the radiation incident. Usually, the standard conditions are: irradiance
of 100 mW/cm2, standard reference AM1.5 spectrum and temperature of 25C.
Some common solar cell types
High quality crystalline silicon and gallium arsenide solar cells can achieve efficiencies approaching
25%, but are relatively expensive because the cost of growing and processing large single-crystal
wafers is high. The p-i-n structure is used for silicon cells in order to get an active light absorbing
layer that is over 100 microns thick.
Thin-film solar cells can be much cheaper, but are not as efficient (10-15%). A very common mate-
rial for thin-film cells is amorphous silicon. Silicon is a four-fold coordinated atom that is normally
tetrahedrally bonded to four neighboring silicon atoms. In crystalline silicon this tetrahedral structure
is continued over a large range, forming a well-ordered lattice (crystal). In amorphous silicon this
long range order is not present and the atoms form a continuous random network. Not all the atoms
within amorphous silicion are four-fold coordinated. Due to the disordered nature of the material
some atoms have a dangling bond. These dangling bonds are defects in the continuous random net-
work, which cause undesired (electrical) behaviour. The material can be passivated by hydrogen,
which bonds to the dangling bonds and neutralises this defect. Hydrogen passivated amorphous sili-
con has a sufficiently low amount of defects to be used within devices. Amorphous silicon can be
deposited over large areas using chemical vapor deposition methods.
Amorphous silicon (a-Si) becomes a direct-gap semiconductor with an band gap of about 1.75 eV.
Absorption is higher in a-Si compared to crystal silicon (c-Si), but p-i-n structures are generally still
used. The transport properties of a-Si are inferior to c-Si and so many carriers can recombine before
they reach the contacts, reducing the efficiency of the cell.
25
20
Efficiency (%)
15
10 crystalline Si
amorphous Si
nano TiO2
5 CIS/CIGS
CdTe
3 TW
3 phase CCD
clocking
t1
t2
t3
In the fashion indicated, charge is transferred down the line. In the modern CCD image sensor, there is
one such CCD transfer line for each column of the array. During the image exposure, one phase in each
column is biased in deep depletion. Light passes through the gate electrodes, which are made thin enough
so that most of the light creates electron-hole pairs in the substrate, which are then collected under the
gates. To read out the array, each column is clocked down by one. At the bottom, there is one extra CCD
line oriented in the horizontal direction. The columns deposit their charge in this horizontal array, which
then clocks out to a charge sensitive amplifier and then off-chip. In turn, the array is read out one line at a
time in this fashion.
to readout amplifier
Liquid Crystal
crystals liquid vapor
Liquid Crystal
orientation
layers
orientation
Properties of LC
Dielectric anisotropy
= – || 0
||
extraordinary (ne)
n = n e – n o 0
ordinary (no)
polarizers
100% Tmax
90%
For normally-white case.
Relative Normally-black is a mirror image of
T
normally white.
10%
Tmin
V90 V10
Voltage
Example:
T
Non-linearity increases as increasing
twist STN TN .
90
180
270
Voltage
active area
You can calculate the pixel size
for a given display type and size.
pixel area
Triad r Stripe r
g b rgb g
b
row electrode
– stripes of conductor on oppos-
ing glass plates
– pixels defined by intersection
of electrodes
column electrode
Active Matrix
Example: Laptop display, desktop monitor
– array of pixel electrodes on one
glass plate
– switch at each pixel for isolation
–less crosstalk
– an active element is used as a
switch to store charge on LC
capacitor