Fabrication Process-2
Fabrication Process-2
p substrate
SiO2
p substrate
Spin on Photoresist
Photoresist is a light-sensitive organic polymer
Softens where exposed to light
Photoresist
SiO2
p substrate
Photoresist
SiO2
p substrate
Photoresist
SiO2
p substrate
SiO2
p substrate
SiO2
n well
• For diffusion in silicon, boron is the most popular dopant for introducing a p-type impurity, whereas
arsenic and phosphorus are used extensively as n-type dopants.
n well
p substrate
Polysilicon
Thin gate oxide
n well
p substrate
Polysilicon
Thin gate oxide
n well
p substrate
n well
p substrate
n+ Diffusion
n well
p substrate
n+ n+ n+
n well
p substrate
n+ n+ n+
n well
p substrate
Similar set of steps form p+ diffusion regions for PMOS source and drain and
substrate contact
p+ Diffusion
p+ n+ n+ p+ p+ n+
n well
p substrate
Contact
n well
p substrate