ELEC425 Assignment3 Solutions
ELEC425 Assignment3 Solutions
Assignment 3
Assignment 3.
1.15 (1.0%), 4.4 (0.5%), 4.8 (0.5%), 4.9 (0.5%), 4.10 (0.5%), 4.11 (0.5%),
4.12 (0.5%), 4.15 (0.5%), 4.16 (0.5%)
Solution.
a)
dλ c
=− 2
dν ν
c = λν
dλ λν λ
=− 2 =−
dν ν ν
The negative sign means that if λ increases by dλ then ν decreases by dν. The
spectral width, ∆λ or ∆ν are much smaller than the emission wavelength (or the
central wavelength, λ₀) or the emission frequency (or the central frequency),
respectively. The negative sign is omitted since ∆λ and ∆ν the intervals centered
on λ₀ and ν₀, respectively. ∆λ and ∆ν are positive quantities.
ELEC425/1-2012 2
Assignment 3
λ0 λ2
∆λ = ∆ν = ∆ν 0
ν0 c
The coherent length lc is determined by the temporal coherent time ∆t which is
determined by the frequency width ∆ν and hence by ∆λ
1 λ2 λ2
lc = c∆t = c = c 0 = 0
∆ν c∆λ ∆λ
b) λ₀ = 632.8 nm and ∆ν ≈ 1.5 GHz
λ20
∆λ = ∆ν
c
(632.8 × 10 −9 ) 2
∆λ = 1.5 × 10 9 ≈ 2.00 pm
3 × 10 8
Solution.
c3
ρ (hν ) > 1
8πhν 3
8πhν 3 8πh
ρ (hν ) > = 3
c3 λ
8π × 6.626 × 10 −34
ρ (hν ) > = 1.43 × 10 −13 J s m −3
(
488 × 10 −9 3
)
N ph hν
ρ (hν ) ≈
∆ν
ρ (hν )∆ν
n ph = N ph =
hν
1.43 × 10 −13 × 2 × 5 × 109 × 488 × 10 −9
n ph = −34 8
= 3.5 × 1015 photons/m 3
6.626 × 10 × 3 × 10
The obtained critical photon concentration for stimulated emission just exceeds
spontaneous emission in the absence of any photon losses. It does not represent the
photon concentration for laser operation. In practice, the photon concentration is
much greater during laser operation.
Solution.
p+ n+
Ec e− EFn
A Ec
Eg
Ev B
EFp Ev
h+
The energy band diagram of a degenerately doped p-n with with a sufficiently
large forward bias to just cause population inversion where A and B overlap.
© 1999 S.O. Kasap, Optoelectronics (Prentice Hall)
Figure 4.38. GaAs laser diode, energy diagram.
Solution.
The potential barrier from Ec (n-side) to Ec (p-side) is ∆Ec and in valence band
∆Ec=Ev(p-side)-Ev(n-side).
To reach population inversion, the Fermi level EFp must be at least 1/2∆Ec below
Ev(p-side) or 1/2∆Ec above Ev (n-side) and EFn must be at least 1/2∆Ec above Ec (n-
side), Figure 4.38.
Thus population inversion occurs when,
ELEC425/1-2012 6
Assignment 3
EFn-EFp=[Ec(n-side)+1/2∆Ec]-[Ev(n-side)+1/2∆Ec]=Eg
If EFi is Fermi level in intrinsic material, then for n=p EFn-EFi= EFi-EFp
Substituting for EFp=EFn-Eg
EFn-EFi= EFi-(EFn-Eg)
2EFn-2EFi=Eg
Assuming that EFn-EFi=Eg/2=1.43/2=0.715 eV
Minimum carrier concentration is
n = ni exp[(E Fn − E Fi ) / (k B T )] = 10 7 exp[0.715 / 0.0259] = 1019 cm -3
n >> ni this is a degenerate doping.
Solution.
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Assignment 3
I= = (1 − R )
Wd 2nλ
where R is the reflectance of the crystal face.
b) Consider one round trip through the cavity. The length L is traversed twice and
there is one reflectance at each end. The overall attenuation of the coherent
radiation after one-round trip is
R·Rexp[-α(2L)]
where R is the reflectance of the crystal end.
Equivalently, this reduction can be represented as an effective or a total loss
coefficient αt such that after one round trip, the reduction factor is exp[-αt(2L)]
Equating these two expressions R·Rexp[-α(2L)] = exp[-αt(2L)] and rearranging,
αt = α+1/(2L)ln(1/R²)
The reflectance is
2 2
n − 1 3.5 − 1
R= = = 0.309
n + 1 3.5 + 1
The total loss coefficient is
1 1 1 1
αt = α + ln 2 = 1000m −1 + −6
ln 2
= 2.0574 ⋅104 m -1
2L R 2 × 60 × 10 0.309
The average time for a photon to be lost from the cavity due to transmission
through the end-faces, scattering and absorption in the semiconductor is
n 3.5
τ ph = = = 0.567 ps
cα t (3 ×10 )(2.0574 ⋅104 )
8
Coherent radiation is lost from the cavity after, on average, 0.567 ps.
c) From
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Assignment 3
nth ed
J th =
τ sp
threshold concentration is
nth =
J thτ sp
=
(500 ×10 )(10 ×10 )
4 −12
≈ 1.25 ×1021 m -3 or 1.25 ×1015 cm-3
ed (1.6 ×10−19 )(0.25 ×10−6 )
from given current of 5 mA the current density is
J=I/(WL)
0.005
J= = 8.33 ×106 A m -2
(10 ×10−6 )(60 ×10−6 )
P0 =
( )
2
6.626 × 10−34 3 × 108 × 4.72 × 1019 × 0.25 × 10−6 × 10 × 10−6
× (1 − 0.309) ≈ 5.3 ⋅10-4 W or 0.53 mW
−9
2 × 3.5 × 1310 × 10
Solution.
∆λ m = =
(1550 × 10 ) = 1.20 nm
λ2 −9 2
Solution.
1.6 × 10 −19 × 3 × 10 −3
η EQE = = 0.079 or 7.9%
40 × 10 −3 × 0.9464 × 1.6 × 10 −19
e dP0 1.6 × 10 −19 (4 − 3)10 −3
η EDQE = = = 0.211 or 21.1%
E g dI 0.9464 × 1.6 × 10 −19 (45 − 40 )10 −3
P0 3 × 10 −3
η EPE = = = 0.0535 or 5.35%
IV 40 × 10 −3 × 1.4
Solution.
The lowest energy levels with respect to the CB edge Ec in InGaAs are determined
by the energy of an electron in a one-dimensional potential energy well
h2n2
εn = ∗ 2
8me d
where n is a quantum number 1, 2, 3, …, εn is the electron energy with respect to
Ec, in InGaAs, or εn=En-Ec
using d=10x10⁻⁹ m, me*=0.04me and n = 1 and 2, we find the following electron
energy levels
n=1
h2n2 (6.626 ⋅ 10 −34 ) 2 12
εn = * 2 = = 1.51 × 10 − 20 J = 0.094 eV
8me d (
8 × 0.04 × 9.11 × 10 −31 10 × 10 −9 )2
ε₁=0.094 eV
n=2
ε₂=ε₁·2²=0.376 eV
for holes using d=10x10⁻⁹ m, mh*=0.44me and n = 1, the hole energy levels below
Ev is
n=1
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Assignment 3
The wavelength light emission from the QW laser with Eg (InGaAs) = 0.7 eV is
hc 6.626 × 10 −34 × 3 × 108
λQW = = = 1548 × 10 −9 m or 1548 nm
(
E g + ε 1 + ε 1 (0.70 + 0.094 + 0.00855) 1.6 × 10
' −19
)
The wavelength of emission from bulk InGaAs with Eg = 0.70 eV is
hc 6.626 × 10 −34 × 3 × 108
λg = = = 1771× 10 −9 m or 1771 nm
Eg (
(0.70) 1.6 × 10 −19 )
The difference is
λg – λQW = 1771 – 1548 = 223 nm.
Solution.
The lowest energy levels with respect to the conduction band edge Ec in GaAs are
determined by the energy of an electron in a one-dimensional potential energy well
h2n2
εn =
8me∗ d 2
where n is a quantum number 1, 2, 3, …, εn is the electron energy with respect to
Ec, in GaAs, or εn=En-Ec.
using d=8x10⁻⁹ m, me*=0.07me and n = 1, 2, and 3, we find the following electron
energy levels
n=1
h2n2 (6.626 ⋅ 10 −34 ) 2 12
εn = = = 0.1345 × 10 −19 J = 0.084 eV
(
8me* d 2 8 × 0.07 × 9.11 × 10 −31 8 × 10 −9 )
2
ε₁ = 0.084 eV
n=2
ε₂ = ε₁·2² = 0.336 eV
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Assignment 3
n=3
ε₃ = ε₁·3² = 0.756 eV
Note: Whether ε₃ is allowed depends on the depth of the quantum well (QW) and
hence on the bandgap of the sandwiching semiconductor.
The hole energy below Ev is
h2n2 (6.626 ⋅10 −34 ) 2 12
ε n' = = = 0.02003 × 10 −19 J = 0.0125eV
(
8mh* d 2 8 × 0.47 × 9.11 × 10 −31 8 × 10 −9 )
2