Yang2010 PDF
Yang2010 PDF
RESEARCH ARTICLE
ABSTRACT
We present industrialized bifacial solar cells on large area (149 cm2) 2 cm CZ monocrystalline silicon wafers processed
with industrially relevant techniques such as liquid source BBr3 and POCl3 open-tube furnace diffusions, plasma enhanced
chemical vapor deposition (PECVD) SiNx deposition, and screen printed contacts. The fundamental analysis of the paste
using at boron-diffused surface and the bifacial solar cell firing cycle has been investigated. The resulting solar cells have
front and rear efficiencies of 16.6 and 12.8%, respectively. The ratio of the rear JSC to front JSC is 76.8%. It increases the
bifacial power by 15.4% over a conventional solar cell at 20% of 1-sun rear illumination, which equals to the power
of a conventional solar cell with 19.2% efficiency. We also present a bifacial glass–glass photovoltaic (PV) module with
30 bifacial cells with the electrical characteristics. Copyright # 2010 John Wiley & Sons, Ltd.
KEYWORDS
bifacial; boron diffusion; screen-printing
*Correspondence
L. Yang, Solar Energy Institute of the Physics Department, Shanghai Jiao Tong University, Shanghai, PR China.
E-mail: [email protected]
Figure 1. Schematic diagram of the bifacial solar cell with pþpnþ structure.
saturation current density J0 and the effective lifetime in Understanding the back and front conductor paste
silicon solar cells.[10] As part of this work boron diffusion properties and their interaction with the co-firing step is
conditions have been tailored in order to achieve critical critical to getting high quality screen-printed contacts. The
cell physical parameters necessary for bifacial operation. contact resistance at the front and rear must be low. Thus,
Furthermore, we have shown that plasma enhanced the use of an appropriate rear contact conductor paste and
chemical vapor deposition (PECVD) silicon nitride layer optimized firing cycle is critical to proper solar cell
can mask against cross-diffusion during the boron and operation.[14] To achieve this we used a co-firing condition
phosphorus diffusion processes. for conventional Al–BSF cells. Since aluminum surface for
a standard Al–BSF cell and the SiNx dielectric for the
2. EXPERIMENTAL
Table I. Processing sequence for bifacial solar cells.
We need to diffuse two different impurities phosphorus and Process Process description
boron into front and rear surface separately to achieve the sequence
bifacial solar cell pþpnþ or pþnnþ structure. Boron and
phosphorus diffusions were performed in a tube furnace I Substrate chemical polish/RCA standard clean
employing liquid sources: BBr3 liquid source for boron and II BBr3 boron diffusion (face to face)
POCl3 liquid source for phosphorous. To achieve III SiN deposition on boron-diffused side (pþ side)
comparable junction characteristics, boron diffusion in IV Alkaline texturing
Si requires much higher diffusion temperatures than V POCl3 diffusion (back to back)
phosphorus diffusion in Si.[11,12] As a means to assure VI SiN deposition on phosphorus-diffused
optimum boron and phosphorus diffusion conditions side (nþ side)
minimizing their impact on the post-diffusion wafer VII Screen-printing of AgAl paste on pþ surface
lifetime, we measured the effective minority carrier and drying
lifetime as a function of the excess minority carrier VIII Screen-printing of Ag paste on nþ surface
density Dn (at 1015 cm3 injection level) using the quasi- IX Co-firing of the contacts
steady-state photoconductance (QSS-PC) technique.[13]
In this work, we used 200 mm thick 2 V cm p-type
Czochralski silicon wafers. After saw damage removal,
substrates were cleaned by standard ratio corporation of
America (RCA) clean. Next, boron diffusion was
performed in a conventional tube furnace using BBr3
liquid source at a set temperature of 1020 8C. This was
followed by the boron glass removal and deionized (DI)
water rinse before the PECVD SiNx anti-reflection coating
and masking layer was deposited; layer thickness was
optimized to guarantee the adequate masking of the
subsequent phosphorus diffusion. Afterwards, the front
side alkaline texturing was performed prior to phosphorus
diffusion using POCl3. The rest of the process steps are
outlined in Table I. The diffusion profiles were measured
using spreading resistance analysis (SRA) with 1 mm x-
step increments to understand the surface concentration Figure 2. Boron and phosphorus carrier concentrations deter-
and junction depths (Figure 2). mined by SRA.
276 Prog. Photovolt: Res. Appl. 2011; 19:275–279 ß 2010 John Wiley & Sons, Ltd.
DOI: 10.1002/pip
L. Yang et al. Screen printed high efficiency bifacial solar cells
Figure 3. Comparison diagrams of the measured bifacial solar cell firing curve and the conventional Al–BSF solar cell at same firing
process condition. (a) Zooms into the firing peak temperature profile indicating the differences in temperature during the firing of the
bifacial and conventional cells fabricated in this study. (b) SEM image of the silver–aluminum paste at the boron-diffused silicon surface
after metal etching showing a large density of Ag–Si crystallites.
bifacial cell design have different heat absorption 3. RESULTS AND DISCUSSION
coefficients, the monofacial and bifacial solar cells will
experience different peak temperatures for the same set Figure 2 shows the boron and phosphorus diffusion profiles
points as shown in Figure 3. Silver–silicon island size and at different drive-in temperatures. The carrier concen-
distribution are heavily impacted by paste formulation and tration after the boron diffusion (drive-in at 1020 8C) was
the firing process and play a critical role in defining contact 6.5 1019 cm3 and junction depth was 0.7 mm. The
resistance.[15,16] Figure 3b shows SEM surface image of junction depth for the phosphorus diffusion (driven-in at
the boron-diffused surface after contact formation and 950 8C) is 0.4 mm with a surface carrier concentration of
subsequent metallization etching displaying a high-density 2.0 1020 cm3. We measured an implied Voc value of
of small silver–silicon islands. A high rear illumination fill 635 mV and effective lifetime (teff) of 45 ms after the
factor (FF) has been realized, although such high FF could diffusion steps.
also be a result of the lower short circuit current under rear The electrical parameters and I–V curves for the bifacial
illumination. solar cell are presented in Figure 4. Our fabricated bifacial
Figure 4. Front and rear electrical parameters and I–V curve of the bifacial solar cell, measured at UCEP, Georgia Institute of
Technology, under terrestrial standard testing conditions (STC).
Prog. Photovolt: Res. Appl. 2011; 19:275–279 ß 2010 John Wiley & Sons, Ltd. 277
DOI: 10.1002/pip
Screen printed high efficiency bifacial solar cells L. Yang et al.
278 Prog. Photovolt: Res. Appl. 2011; 19:275–279 ß 2010 John Wiley & Sons, Ltd.
DOI: 10.1002/pip
L. Yang et al. Screen printed high efficiency bifacial solar cells
which produced low contact resistance. Fill factors of 6. Hilali MM, Gee JM, Hacke P. Bow in screen-printed
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