Qualification Testing For PCB PDF
Qualification Testing For PCB PDF
TABLE OF CONTENTS
AEC-Q100 Failure Mechanism Based Stress Test Qualification for Integrated Circuits
Appendix 1:
Appendix 2:
Appendix 3:
Appendix 4:
Appendix 5:
Appendix 6:
Appendix 7
Attachments
AEC-Q100-001:
AEC-Q100-002:
AEC-Q100-003:
AEC-Q100-004:
IC LATCH-UP TEST
AEC-Q100-005:
AEC-Q100-006:
AEC-Q100-007:
AEC-Q100-008:
AEC-Q100-009:
AEC-Q100-010:
AEC-Q100-011:
AEC-Q100-012:
Revision Summary
This informative section briefly describes the changes made in the AEC-Q100 Rev-H document, compared to
previous document version, AEC-Q100 Rev-G (May 14, 2007). Punctuation and text improvements are not
included in this summary.
Acknowledgment
Any document involving a complex technology brings together experience and skills from many sources. The
Automotive Electronics Council would especially like to recognize the following significant contributors to the
revision of this document:
Sustaining Members:
Bankim Patel
Autoliv
Drew Hoffman
Earl Fischer
Autoliv
Gary Fisher
John Schlais
Hadi Mehrooz
Brad Ulery
Mark A. Kelly
Ramon Aziz
Mike Wiegand
Continental Corporation
Continental Corporation
Cummins
Delphi Corporation
Delphi Corporation
Denso International
Steve Sibrel
Ludger Kappius
Joe Lucia
Eric Honsowetz
Thomas VanDamme
Jorge Marta
Gentex
Gentex (formerly with Johnson
Controls)
Harmon
Hella
John Deere
Lear Corporation
TRW Automotive
Visteon Corporation
Technical Members:
Tim Haifley
Jean-Pierre Guerre
Heinz Reiter
James Molyneaux
Xin Miao Zhao
Rene Rodgers
Nick Lycoudes
Werner Kanert
Scott Daniels
Lyn Zastrow
Banjie Bautista
Tom Lawler
John Grogan
Warren Chen
Jeff Aquino
Mike Buzinski
Nick Martinez
Angelo Visconti
Altera
Altera
AMS
Analog Devices
Cirrus Logic
Cypress Semiconductor
Freescale
Infineon Technologies
International Rectifier
ISSI
ISSI
Lattice Semiconductor
Macronix
Macronix
Maxim Integrated
Microchip
Microchip
Micron
Zhongning Liang
Bob Knoell [Q100 Team Leader]
Peter Turlo
Daniel Vanderstraeten
Pamela Finer
Tony Walsh
Futoshi Tagami
Francis Classe
Bassel Atala
Mike Cannon
Larry Ting
James Williams
Gerardo Sepulveda
Arthur Chiang
David Leandri
Anca Voicu
Dean Tsaggaris
NXP Semiconductors
NXP Semiconductors
ON Semiconductor
ON Semiconductor
Pericom Semiconductor
Renesas Electronics
Renesas Electronics
Spansion
STMicroelectronics
TDK
Texas Instruments
Texas Instruments
Tyco Electronics
Vishay
Vishay
Xilinx
Xilinx
Associate Members:
James McLeish
Jeff Darrow
Andy Mackie
Weiyen Kuo
DfR Solutions
Global Foundries
Indium Corporation
TSMC
Guest Members:
Jeff Jarvis
AMRDEC
Other Contributors:
Wolfgang Reinprecht
Alan Righter
John Timms
Richard Forster
John Monteiro
Paul Ngan
Theo Smedes
Rene Rongen
AMS
Analog Devices
Continental Corporation
Continental Corporation
formerly with Delphi
NXP Semiconductors
NXP Semiconductors
NXP Semiconductors
Thomas Hough
Thomas Stich
Donna Moreland
Scott Ward
Marty Johnson
Colin Martin
Kedar Bhatawadekar
Cesar Avitia
Renesas Electronics
Renesas Electronics
Texas Instruments
Texas Instruments
Texas Instruments
formerly withTexas Instruments
Tyco Electronics
Visteon Corporation
NOTICE
AEC documents contain material that has been prepared, reviewed, and approved through the AEC
Technical Committee.
AEC documents are designed to serve the automotive electronics industry through eliminating
misunderstandings between manufacturers and purchasers, facilitating interchangeability and improvement of
products, and assisting the purchaser in selecting and obtaining with minimum delay the proper product for
use by those other than AEC members, whether the standard is to be used either domestically or
internationally.
AEC documents are adopted without regard to whether or not their adoption may involve patents or articles,
materials, or processes. By such action AEC does not assume any liability to any patent owner, nor does it
assume any obligation whatever to parties adopting the AEC documents. The information included in AEC
documents represents a sound approach to product specification and application, principally from the
automotive electronics system manufacturer viewpoint. No claims to be in Conformance with this document
shall be made unless all requirements stated in the document are met.
Inquiries, comments, and suggestions relative to the content of this AEC document should be addressed to
the AEC Technical Committee on the link http://www.aecouncil.com.
Published by the Automotive Electronics Council.
This document may be downloaded free of charge, however AEC retains the copyright on this material. By
downloading this file, the individual agrees not to charge for or resell the resulting material.
Printed in the U.S.A.
All rights reserved
Copyright 2014 by the Automotive Electronics Council. This document may be freely reprinted with this
copyright notice. This document cannot be changed without approval from the AEC Component Technical
Committee.
SCOPE
This document contains a set of failure mechanism based stress tests and defines the minimum
stress test driven qualification requirements and references test conditions for qualification of
integrated circuits (ICs). These tests are capable of stimulating and precipitating semiconductor
device and package failures. The objective is to precipitate failures in an accelerated manner
compared to use conditions. This set of tests should not be used indiscriminately. Each qualification
project should be examined for:
a.
b.
c.
Use of this document does not relieve the IC supplier of their responsibility to meet their own
company's internal qualification program. In this document, "user" is defined as all customers using a
device qualified per this specification. The user is responsible to confirm and validate all qualification
data that substantiates conformance to this document. Supplier usage of the device temperature
grades as stated in this specification in their part information is strongly encouraged.
1.1
Purpose
The purpose of this specification is to determine that a device is capable of passing the specified
stress tests and thus can be expected to give a certain level of quality/reliability in the application.
1.2
Reference Documents
Current revision of the referenced documents will be in effect at the date of agreement to the
qualification plan. Subsequent qualification plans will automatically use updated revisions of these
referenced documents.
1.2.1
Automotive
AEC-Q001 Guidelines for Part Average Testing
AEC-Q002 Guidelines for Statistical Yield Analysis
AEC-Q003 Guidelines for Characterizing the Electrical Performance
AEC-Q004 Zero Defects Guideline (DRAFT)
AEC-Q005 Pb-Free Requirements
SAE J1752/3 Integrated Circuits Radiated Emissions Measurement Procedure
1.2.2
Military
MIL-STD-883 Test Methods and Procedures for Microelectronics
Page 1 of 42
1.2.3
Industrial
JEDEC JESD-22 Reliability Test Methods for Packaged Devices
UL-STD-94 Tests for Flammability of Plastic materials for parts in Devices and Appliances
IPC/JEDEC J-STD-020 Moisture/Reflow Sensitivity Classification for Plastic Integrated Circuit
Surface Mount Devices
JESD89 Measurement and Reporting of Alpha Particle and Terrestrial Cosmic Ray-Induced Soft
Errors in Semiconductor Devices
JESD89-1 System Soft Error Rate (SSER) Test Method
JESD89-2 Test Method For Alpha Source Accelerated Soft Error Rate
JESD89-3 Test Method for Beam Accelerated Soft Error Rate
1.2.4
Decommissioned
AEC Q100-003 ESD Machine Model
Removed from JEDEC due to obsolescence. HBM and CDM cover virtually all known
ESD-related failure mechanisms.
AEC Q100-006 Electrothermally-Induced Gate Leakage
Removed due to the lack of need for it as a qualification test.
1.3
Definitions
1.3.1
1.3.2
AEC Certification
Note that there are no "certifications" for AEC-Q100 qualification and there is no certification board
run by AEC to qualify parts. Each supplier performs their qualification to AEC standards, considers
customer requirements and submits the data to the customer to verify compliance to Q100.
1.3.3
Page 2 of 42
1.3.4
-40C to +150C
-40C to +125C
-40C to +105C
-40C to +85C
The endpoint test temperatures for hot and cold test, if required for that stress test, must be
equivalent to those specified for the particular grade. If accounting for junction heating during
powered test, hot test endpoint test temperature can be greater.
For Test Group B Accelerated Lifetime Simulation Tests: High Temperature Operating Life (HTOL),
Early Life Failure Rate (ELFR) and NVM Endurance, Data Retention, and Operational Life (EDR), the
junction temperature of the device during stressing should be equal to or greater than the hot
temperature for that grade.
1.3.5
2.
GENERAL REQUIREMENTS
2.1
Objective
The objective of this specification is to establish a standard that defines operating temperature grades
for integrated circuits based on a minimum set of qualification requirements.
2.1.1
Zero Defects
Qualification and some other aspects of this document are a subset of, and contribute to, the
achievement of the goal of Zero Defects. Elements needed to implement a zero defects program can
be found in AEC-Q004 Zero Defects Guideline.
Page 3 of 42
2.2
Precedence of Requirements
In the event of conflict in the requirements of this standard and those of any other documents, the
following order of precedence applies:
a.
b.
c.
d.
e.
The purchase order (or master purchase agreement terms and conditions)
The (mutually agreed) individual device specification
This document
The reference documents in Section 1.2 of this document
The supplier's data sheet
For the device to be considered a qualified part per this specification, the purchase order and/or the
individual device specification cannot waive or detract from the requirements of this document.
2.3
2.3.1
Page 4 of 42
2.3.3
Supplier Start
of Production
Internal Device
Characterization
Supplier Internal
Qualification
Present
Process Change
Qualification
Customer #2
Specific
Qualification
Customer #1
Specific
Qualification
Process Change
Qualification
History
Periodic Reliability
Monitor Tests
Note: Some process changes (e.g., die shrink) will affect the use of
generic data such that data obtained before these types of
changes will not be acceptable for use as generic data.
Test Samples
2.4.1
Lot Requirements
Test samples shall consist of a representative device from the qualification family. Where multiple lot
testing is required due to a lack of generic data, test samples as indicated in Table 2 must be
composed of approximately equal numbers from non-consecutive wafer lots, assembled in nonconsecutive molding lots. That is, they must be separated in the fab or assembly process line by at
least one non-qualification lot. Any deviation from the above requires technical explanation from the
supplier.
2.4.2
Production Requirements
All qualification devices shall be produced on tooling and processes at the manufacturing site that will
be used to support part deliveries at production volumes. Other electrical test sites may be used for
electrical measurements after their electrical quality is validated.
Page 5 of 42
2.4.3
2.4.4
2.4.5
2.5
3.
3.1
3.2
Page 6 of 42
3.2.1
3.2.2
3.2.3
3.2.4
User Approval
A change may not affect a device's operating temperature grade, but may affect its performance in an
application. Individual user authorization of a process change will be required for that users
particular application(s), and this method of authorization is outside the scope of this document.
3.3
4.
QUALIFICATION TESTS
4.1
General Tests
Test flows are shown in Figure 2 and test details are given in Table 2. Not all tests apply to all
devices. For example, certain tests apply only to ceramic packaged devices, others apply only to
devices with NVM, and so on. The applicable tests for the particular device type are indicated in the
Note column of Table 2. The Additional Requirements column of Table 2 also serves to highlight
test requirements that supersede those described in the referenced test method. Any unique
qualification tests or conditions requested by the user and not specified in this document shall be
negotiated between the supplier and user requesting the test.
Page 7 of 42
4.2
4.3
Electromigration
Time-Dependent Dielectric Breakdown (or Gate Oxide Integrity Test) - for all MOS technologies
Hot Carrier Injection - for all MOS technologies below 1 micron
Negative Bias Temperature Instability
Stress Migration
Page 8 of 42
ABV
Preconditioning
PC
TemperatureHumidity-Bias or
Biased HAST
THB or
HAST
Autoclave or
Unbiased HAST or
TemperatureHumidity (without
Bias)
AC or
UHST
or TH
NOTES
A1
P, B, S,
N, G
A2
P, B, D,
G
A3
P, B, D,
G
SAMPLE
SIZE / LOT
77
77
77
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST METHOD
ADDITIONAL REQUIREMENTS
0 Fails
JEDEC
J-STD-020
JESD22-A113
0 Fails
JEDEC
JESD22-A101 or
A110
JEDEC
JESD22-A102,
A118, or A101
0 Fails
Page 10 of 42
Temperature
Cycling
ABV
TC
A4
NOTES
H, P, B,
D, G
SAMPLE
SIZE / LOT
77
NUMBER
OF LOTS
ACCEPT
CRITERIA
0 Fails
TEST
METHOD
JEDEC
JESD22-A104
and Appendix 3
ADDITIONAL REQUIREMENTS
PC before TC for surface mount devices.
Grade 0: -55C to +150C for 2000 cycles or equivalent.
Grade 1: -55oC to +150oC for 1000 cycles or equivalent.
Note: -65oC to 150oC for 500 cycles is also an
allowed test condition due to legacy use with no
known lifetime issues.
Grade 2: -55C to +125C for 1000 cycles or equivalent.
Grade 3: -55C to +125C for 500 cycles or equivalent.
TEST before and after TC at hot temperature. After
completion of TC, decap five devices from one lot and
perform WBP (test #C2) on corner bonds (2 bonds per
corner) and one mid-bond per side on each device.
Preferred decap procedure to minimize damage and chance
of false data is shown in Appendix 3.
Power
Temperature
Cycling
High Temperature
Storage Life
PTC
HTSL
A5
A6
H, P, B,
D, G
H, P, B,
D, G, K
45
45
0 Fails
0 Fails
Page 11 of 42
JEDEC
JESD22-A105
JEDEC
JESD22-A103
ABV
NOTES
SAMPLE
SIZE / LOT
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST
METHOD
ADDITIONAL REQUIREMENTS
For devices containing NVM, endurance preconditioning
must be performed before HTOL per Q100-005.
Grade 0: +150C Ta for 1000 hours.
Grade 1: +125oC Ta for 1000 hours.
Grade 2: +105C Ta for 1000 hours.
Grade 3: +85C Ta for 1000 hours.
HTOL NOTES:
1) HTOL stress times for the appropriate grade Ta are
the min requirement; the Tj of the test (measured or
calculated ) should be available.
2) Tj may be used instead of Ta when performing HTOL
provided that Tj of the device under HTOL conditions
is equal to or higher than the Tj maximum operating
(Tjopmax) of the particular device, but below the
absolute maximum Tj.
3) If Tj is used to set the HTOL conditions, the minimum
stress of 1000 hours at the Ta of the device is to be
shown using activation energy of 0.7ev or other value
technically justified.
4) Vcc (max) at which dc and ac parametrics are
guaranteed. Thermal shut-down shall not occur during
this test. TEST before and after HTOL at room, cold,
and hot temperature (in that order).
High Temperature
Operating Life
HTOL
B1
H, P, B,
D, G, K
77
0 Fails
JEDEC
JESD22-A108
ELFR
B2
H, P, B,
N, G
800
0 Fails
AEC Q100-008
NVM Endurance,
Data Retention, and
Operational Life
EDR
B3
H, P, B,
D, G, K
77
0 Fails
AEC Q100-005
Page 12 of 42
ABV
NOTES
WBS
C1
H, P, D,
G
WBP
ACCEPT
CRITERIA
TEST
METHOD
ADDITIONAL REQUIREMENTS
CPK >1.67
AEC
Q100-001
AEC Q003
CPK >1.67
or 0 Fails
after TC (test
#A4)
MIL-STD883
Method 2011
AEC Q003
C3
H, P, D,
G
15
>95% lead
coverage
PD
C4
H, P, D,
G
10
CPK >1.67
JEDEC
JESD22-B100
and B108
AEC Q003
SBS
C5
5 balls from
a min. of 10
devices
CPK >1.67
AEC
Q100-010
AEC Q003
LI
C6
H, P, D,
G
10 leads
from each
of 5 parts
No lead
breakage or
cracks
JEDEC
JESD22-B105
SD
Physical
Dimensions
Lead Integrity
H, P, D,
G
NUMBER
OF LOTS
JEDEC
JESD22-B102
or
JEDEC
J-STD-002D
Solderability
C2
SAMPLE
SIZE / LOT
Only
NOTES
SAMPLE
SIZE / LOT
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST
METHOD
ADDITIONAL REQUIREMENTS
Electromigration
EM
D1
---
---
---
---
---
Time Dependent
Dielectric
Breakdown
TDDB
D2
---
---
---
---
---
STRESS
Page 13 of 42
ABV
NOTES
SAMPLE
SIZE / LOT
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST
METHOD
ADDITIONAL REQUIREMENTS
HCI
D3
---
---
---
---
---
NBTI
D4
---
---
---
---
---
SM
D5
---
---
---
---
---
Electrostatic
Discharge Human
Body Model
Electrostatic
Discharge Charged
Device Model
ABV
TEST
HBM
CDM
E1
E2
E3
NOTES
H, P, B,
N, G
H, P, B,
D
H, P, B,
D
SAMPLE
SIZE / LOT
All
See Test
Method
See Test
Method
NUMBER
OF LOTS
ACCEPT
CRITERIA
All
0 Fails
Target:
0 Fails
2KV HBM
(Classification 2
or better)
Target:
0 Fails
750V corner
pins, 500V all
other pins
(Classification
C4B or better)
Page 14 of 42
TEST
METHOD
ADDITIONAL REQUIREMENTS
Test program to
supplier data
sheet or user
specification
AEC
Q100-002
AEC
Q100-011
Latch-Up
ABV
NOTES
SAMPLE
SIZE / LOT
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST
METHOD
ADDITIONAL REQUIREMENTS
LU
E4
H, P, B,
D
0 Fails
AEC
Q100-004
30
Where
applicable,
CPK >1.67
AEC
Q100-009
AEC Q003
Electrical Distributions
ED
E5
H, P, B,
D
Fault Grading
FG
E6
---
---
---
AEC Q100-007
unless otherwise
specified
AEC
Q100-007
CHAR
E7
---
---
---
---
AEC Q003
---
SAE J1752/3
Radiated
Emissions
0 Fails
AEC
Q100-012
Characterization
Electromagnetic
Compatibility
Short Circuit
Characterization
EMC
SC
E9
E10
---
D, G
10
SER
E11
H, P, D,
G
---
JEDEC
Unaccelerated:
JESD89-1
or
Accelerated:
JESD89-2 &
JESD89-3
LF
E12
See Test
Method
See Test
Method
See Test
Method
AEC Q005
Page 15 of 42
NOTES
SAMPLE
SIZE / LOT
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST
METHOD
Process Average
Testing
PAT
F1
---
---
---
---
AEC Q001
Statistical Bin/Yield
Analysis
SBA
F2
---
---
---
---
AEC Q002
STRESS
ADDITIONAL REQUIREMENTS
The supplier determines the sample sizes and
accept criteria per the test methods. If these tests
are not possible for a given part, the supplier must
provide justification. The supplier determines the
sample sizes and accept criteria per the test
methods. If these tests are not possible for a given
part, the supplier must provide justification. The
supplier must perform some variant of PAT and
SBA that meets the intent of the guideline.
Mechanical Shock
ABV
NOTES
SAMPLE
SIZE / LOT
NUMBER
OF LOTS
ACCEPT
CRITERIA
TEST
METHOD
ADDITIONAL REQUIREMENTS
MS
G1
H, D, G
15
0 Fails
JEDEC
JESD22-B104
Variable Frequency
Vibration
VFV
G2
H, D, G
15
0 Fails
JEDEC
JESD22-B103
Constant Acceleration
CA
G3
H, D, G
15
0 Fails
MIL-STD-883
Method 2001
Gross/Fine Leak
GFL
G4
H, D, G
15
0 Fails
MIL-STD-883
Method 1014
Any single-specified fine test followed by any singlespecified gross test. For ceramic packaged cavity
devices only.
DROP
G5
H, D, G
0 Fails
---
Lid Torque
LT
G6
H, D, G
0 Fails
MIL-STD-883
Method 2024
Die Shear
DS
G7
H, D, G
0 Fails
MIL-STD-883
Method 2019
IWV
G8
H, D, G
0 Fails
MIL-STD-883
Method 1018
Package Drop
Page 16 of 42
All electrical testing before and after the qualification stresses are performed to the limits of the
individual device specification in temperature and limit value.
D
S
G
K
Page 17 of 42
C4
C5
C6
D1
D2
D3
D4
D5
E2
E3
E4
Physical Dimensions
Solder Ball Shear
Lead Integrity
Electromigration
Time Dependent Dielectric Breakdown
Hot Carrier Injection
Negative Bias Temperature Instability
Stress Migration
Human Body Model ESD
Charged Device Model ESD
Latch-up
E5
E7
E9
E10
E11
E12
G1-4
G5
G6
G7
G8
Electrical Distribution
Characterization
Electromagnetic Compatibility
Short Circuit Characterization
Soft Error Rate
Lead Free
Mechanical Series
Package Drop
Lid Torque
Die Shear
Internal Water Vapor
G6
G7
G8
IWV
LT
DS
E E E
G5
D
DROP
G1G4
SER
LF
MECH
E9
E10
E11
E12
SC
E7
G
EMC
E5
M
M
CHAR
E4
TDDB
ED
D2
EM
E3
D1
LI
LU
C6
SBS
E2
C5
PD
CDM
C4
SD
D5
C3
WBP
HBM
C2
WBS
DJ
SM
C1
EDR
D4
B3
ELFR
D3
B1
HTOL
M
A M
NBTI
A6
HTSL
Circuit Rerouting
HCI
A5
PTC
B2
A4
A3
TC
A2
Test Abbreviation
AC
Table 2 Test #
THB
Note: A letter or "" indicates that performance of that stress test should be considered for the appropriate process change. Reason for not
performing a considered test should be given in the qualification plan or results.
DESIGN
Active Element Design
WAFER FAB
Lithography
Die Shrink
DJ
M
M
GN DJ K
M M
Leadframe Plating
Bump Material / Metal System
Leadframe Material
Leadframe Dimension
Diffusion/Doping
Polysilicon
Backside Operation
FAB Site Transfer
DJ
ASSEMBLY
Die Overcoat / Underfill
M
M
M
C
Wire Bonding
Die Scribe/Separate
L
L
L
M
H
H
H
H
H
B
Package Marking
H
H
M
M
M
H
New Package
Substrate / Interposer
Die Attach
Molding Compound
Molding Process
Hermetic Sealing
A
B
C
D
E
F
G
H
J
K
H
H
T
T
H
Page 18 of 42
L
L
L
M
N
Q
T
Product
a.
b.
c.
d.
e.
Page 19 of 42
A1.2
Fab Process
Each process technology (e.g., CMOS, NMOS, Bipolar) must be considered and qualified separately.
No matter how similar, processes from one fundamental fab technology cannot be used for another.
For BiCMOS devices, data must be taken from the appropriate technology based on the circuit under
consideration.
Worst case family requalification with the appropriate tests is required when the process or a
material is changed (see Table A1 for guidelines). The important attributes defining a fab process are
listed below:
a. Wafer Fab Technology (e.g., CMOS, NMOS, Bipolar)
b. Wafer Fab Process - consisting of the same attributes listed below:
Circuit element feature size (e.g., layout design rules, die shrinks, contacts, gates, isolations)
Substrate (e.g., orientation, doping, epi, wafer size)
Number of masks (supplier must show justification for waiving this requirement)
Lithographic process (e.g., contact vs. projection, E-beam vs. X-ray, photoresist polarity)
Doping process (e.g., diffusion vs. ion implantation)
Gate structure, material and process (e.g., polysilicon, metal, salicide, wet vs. dry etch)
Polysilicon material, thickness range & number of levels
Oxidation process and thickness range (e.g., gate & field oxides)
Interlayer dielectric material & thickness range
Metallization material, thickness range & number of levels
Passivation process (e.g., passivation oxide opening), material, & thickness range
Die backside preparation process & metallization
c.
A1.3
Page 20 of 42
c.
A1.4
Plastic mold compound material, organic substrate material, or ceramic package material
Solder Ball metallization system (if applicable)
Heatsink type, material, & dimensions
Plastic Mold Compound Supplier/ID
Die Preparation/Singulation
Assembly Site
Page 21 of 42
New
Device /
Product
Description
Product
An
Fab Site
Min. Lots of
Assembly
Product/Process
Data Needed for
Site
(defined in Appendix A1)
Qualification
Case
Description
Product
Fab Site
B from a different
product family
No Option
3 lots AnCE (new test)
No Option
3 lots using An (new test)
No Option
3 lots AnCE (new test)
No Option
3 lots using An (new test)
2A
B from a different
product family
2B
Different Fab Process
and different site as A1
A1
3
Different Assembly and
different site as A1
Page 22 of 42
Description
4A
4B
Product
Fab Site
C1
A1
E1
Same Assembly
Process but different
site as An
A1
Same Fab Process, but
different site as An
5B
Same Assembly
Process and site as An
Same Fab Process and
site as An
A1
6
Same Assembly
Process and site as An
Page 23 of 42
A1.5
Identify and list the potential failure mechanisms and associated failure modes for the critical
structures and interfaces (see the example in Table A1.3). Note that steps (a) to (c) are
equivalent to the creation of an FMEA.
d. Define the product groupings or families based upon similar characteristics as they relate to the
structures and device sensitivities to be evaluated, and provide technical justification to document
the rationale for these groupings.
e. Provide the qualification test plan, including a description of the change, the matrix of tests, and
the representative products, that will address each of the potential failure mechanisms and
associated failure modes.
f.
Robust process capability must be demonstrated at each site (e.g., control of each process step,
capability of each piece of equipment involved in the process, equivalence of the process stepby-step across all affected sites) for each of the affected process steps.
Potential Failure
Mechanism
Passivation to Mold
Compound Interface
Passivation to
Metallization Interface
Polysilicon and Active
Resistors
Associated Failure
Modes
On These Products
Functional Failures
All Die
Large Die
Stress-Induced Voiding
Functional Failures
Ionic Contamination
Leakage, Parametric
Shifts
All Die
Piezoelectric Leakage
Analog Products
Page 24 of 42
Date:
The following information is required to identify a device that has met the requirements of AEC-Q100. Submission of the
required data in the format shown below is optional. All entries must be completed; if a particular item does not
apply, enter "Not Applicable". This template can be downloaded from the AEC website at http://www.aecouncil.com.
1.
2.
3.
4.
5.
6.
7.
8.
9.
10.
11.
Item Name
Users Part Number:
Suppliers Part Number/Data Sheet:
Device Description:
Wafer/Die Fab Location & Process ID:
a. Facility name/plant #:
b. Street address:
c. Country:
Wafer Probe Location:
a. Facility name/plant #:
b. Street address:
c. Country:
Assembly Location & Process ID:
a. Facility name/plant #:
b. Street address:
c. Country:
Final Quality Control A (Test) Location:
a. Facility name/plant #:
b. Street address:
c. Country:
Wafer/Die:
a. Wafer size:
b. Die family:
c. Die mask set revision & name:
d. Die photo:
Wafer/Die Technology Description:
a. Wafer/Die process technology:
b. Die channel length:
c. Die gate length:
d. Die supplier process ID (Mask #):
e. Number of transistors or gates:
f. Number of mask steps:
Die Dimensions:
a. Die width:
b. Die length:
c. Die thickness (finished):
Die Metallization:
a. Die metallization material(s):
b. Number of layers:
c. Thickness (per layer):
d. % of alloys (if present):
Supplier Response
See attached
Page 25 of 42
Not available
See attached
Single
Not available
Dual
See attached
Not available
Yes
No
See attached
Not available
UL 94 V1
See attached
Page 26 of 42
UL 94 V0
Not available
Not available
%
Not digital circuitry
* Note: Temperatures are as measured on the center of
the plastic package body top surface.
at
C (SnPb)
at
C (Pb-free)
Requirements:
1. A separate Certification of Design, Construction
& Qualification must be submitted for each P/N,
wafer fab, and assembly location.
2. Design, Construction & Qualification shall be
signed by the responsible individual at the supplier
who can verify the above information is accurate
and complete. Type name and sign below.
See attached
Date:
Certified by:
Typed or
Printed:
Signature:
Title:
Page 27 of 42
Date:
Purpose
The purpose of this Appendix is to define a guideline for opening plastic packaged devices so that
reliable wire pull or bond shear results will be obtained. This method is intended for use in opening
plastic packaged devices to perform wire pull testing after temperature cycle testing or for bond shear
testing.
A3.2
A3.2.1 Etchants
Various chemical strippers and acids may be used to open the package dependent on your
experience with these materials in removing plastic molding compounds. Red Fuming Nitric Acid has
demonstrated that it can perform this function very well on novolac type epoxies, but other materials
may be utilized if they have shown a low probability for damaging the bond pad material.
A3.2.2 Plasma Strippers
Various suitable plasma stripping equipment can be utilized to remove the plastic package material.
A3.3
Procedure
a. Using a suitable end mill type tool or dental drill, create a small impression just a little larger than
the chip in the top of the plastic package. The depth of the impression should be as deep as
practical without damaging the loop in the bond wires.
b. Using a suitable chemical etchant or plasma etcher, remove the plastic material from the surface
of the die, exposing the die bond pad, the loop in the bond wire, and at least 75% of the bond
wire length. Do not expose the wire bond at the lead frame (these bonds are frequently made to
a silver plated area and many chemical etchants will quickly degrade this bond making wire pull
testing impossible).
c.
Using suitable magnification, inspect the bond pad areas on the chip to determine if the package
removal process has significantly attacked the bond pad metallization. If a bond pad shows
areas of missing metallization, the pad has been degraded and shall not be used for bond shear
or wire pull testing. Bond pads that do not show attack can be used for wire bond testing.
Page 28 of 42
Plans
1. Part Identification: Customer P/N and supplier P/N.
2. Site or sites at which life testing will be conducted.
3. List of tests to be performed (e.g., JEDEC method, Q100 method, MIL-STD method) along with
conditions. Include specific temperature(s), humidity, and bias to be used.
4. Sample size and number of lots required.
5. Time intervals for end-points (e.g., 0 hour, 500 hour, 1000 hour).
6. Targeted start and finish dates for all tests and end-points.
7. Supplier name and contact.
8. Submission date.
9. Material and functional details and test results of devices to be used as generic data for
qualification. Include rationale for use of generic data.
A4.2
Results
All of above plus:
1.
2.
3.
4.
5.
6.
Page 29 of 42
DATE:
USER P/N:
TRACKING NUMBER:
USER SPEC #:
SUPPLIER COMPANY:
SUPPLIER P/N:
STRESS TEST
Preconditioning
Temperature Humidity Bias or HAST
Autoclave or Unbiased HAST
Temperature Cycle
TEST METHOD
ABV
TEST#
PC
A1
JEDEC J-STD-020
THB / HAST
AC / UHST
A2
A3
JESD22-A101/A110
JESD22-A102/A118
77
77
3
3
3
Min. MSL = 3
TC
A4
JESD22-A104
77
PTC
A5
JESD22-A105
45
HTSL
A6
JESD22-A103
45
HTOL
B1
JESD22-A108
77
ELFR
B2
AEC Q100-008
800
EDR
B3
AEC Q100-005
77
WBS
C1
AEC Q100-001
WBP
C2
MIL-STD-883 - 2011
JESD22-B102
J-STD-002D
JESD22-B100/B108
15
10
Solderability
SD
C3
Physical Dimensions
PD
C4
SBS
C5
AEC Q100-010
10
LI
C6
JESD22-B105
EM
D1
TDDB
D2
Lead Integrity
Electromigration
Time Dependent Dielectric Breakdown
Hot Carrier Injection
HCI
D3
NBTI
D4
SM
D5
Stress Migration
Pre- and Post-Stress Electrical Test
TEST
E1
Test to spec
HBM
E2
AEC Q100-002
CDM
E3
AEC Q100-011
Latch-Up
LU
E4
AEC Q100-004
Electrical Distributions
ED
E5
AEC Q100-009
30
Fault Grading
Characterization
FG
E6
AEC-Q100-007
CHAR
E7
AEC Q003
Electromagnetic Compatibility
EMC
E9
SAE J1752/3
SC
E10
AEC Q100-012
10
SER
E11
JESD89-1, -2, -3
LF
E12
PAT
F1
15
SBA
F2
MECH
G1-4
Package Drop
DROP
G5
Lid Torque
LT
G6
DS
IWV
Q005
AEC Q001
AEC Q002
Series
MIL-STD-883 - 2024
G7
MIL-STD-883 - 2019
G8
MIL-STD-883 - 1018
Approved by:
(User Engineer)
Supplier:
Page 30 of 42
RESULTS
Fails/S.S./# lots
MSL =
Package:
Fab/Assy/Test:
Device Engr:
Product Engr:
Component Engr:
Test #
ABV
End-Point
Requirements
Sample
Size/Lot
# of
Lots
Total #
Units
A1
PC
JEDEC J-STD-020
TEST = ROOM
JESD22-A101/A110
77
231
JESD22-A102/A118
TEST = ROOM
77
231
231
A4
THB /
HAST
AC /
UHST
TC
JESD22-A104
TEST = HOT
77
A5
PTC
JESD22-A105
45
A6
HTSL
JESD22-A103
45
77
231
A2
A3
B1
HTOL
JESD22-A108
TEST = ROOM,
COLD, and HOT
B2
ELFR
AEC Q100-008
800
2400
77
231
B3
EDR
AEC Q100-005
C1
WBS
AEC Q100-001
C2
WBP
C3
SD
MIL-STD-883 2011
JESD22-B102
J-STD-002D
JESD22-B100/B108
>95% solder
coverage
15
15
10
30
All
C4
PD
C5
SBS
AEC Q100-010
C6
LI
JESD22-B105
D1
EM
D2
TDDB
D3
HCI
D4
NBTI
D5
SM
E1
TEST
E2
HBM
10 leads
No lead breakage or
from each
finish cracks
of 5
All units
AEC Q100-002
Var.
Var.
30
90
1
10
3
1
3
1
1
30
3
All units
1
1
1
1
1
1
1
1
All
All
15
15
15
15
5
5
5
3
E3
CDM
AEC Q100-011
E4
LU
AEC Q100-004
E5
ED
AEC Q100-009
E6
E7
E9
E10
E11
E12
F1
F2
G1
G2
G3
G4
G5
G6
G7
G8
FG
CHAR
EMC
SC
SER
LF
PAT
SBA
MS
VFV
CA
GFL
DROP
LT
DS
IWV
AEC Q100-007
AEC Q003
SAE J1752/3
AEC Q100-012
JESD89-1, -2, -3
Q005
AEC Q001
AEC Q002
JESD22-B104
JESD22-B103
MIL-STD-883 2001
MIL-STD-883 1014
All units
TEST = ROOM
TEST = ROOM
TEST = ROOM
TEST = ROOM
MIL-STD-883 2024
MIL-STD-883 2019
MIL-STD-883 - 1018
Part to be
Qualified
15
15
15
15
5
5
5
5
Page 31 of 42
Differences
Generic
Differences
Generic
Differences
from Q100 Family part A from Q100 Family part B from Q100
Part to be Qualified
Page 32 of 42
Part to be Qualified
Note 1:
Design Library cells need to follow guidelines for temperature ranges, voltage ranges, speed,
performance, and power dissipation as defined in Appendix 1.
Page 33 of 42
Use the following criteria to determine if a part is a candidate for EMC testing:
a. Digital technology, LSI, products with oscillators or any technology that has the potential of
producing radiated emissions capable of interfering with communication receiver devices.
Examples include microprocessors, high speed digital IC's, FET's incorporating charge pumps,
devices with watchdogs, and switch-mode regulator control and driver IC's.
b. All new, requalified, or existing IC's that have undergone revisions from previous versions that
have the potential of producing radiated emissions capable of interfering with communication
receiver devices.
A5.2
Page 34 of 42
Use the following criteria to determine if a part is a candidate for SER Testing:
a. The part use application will have a significant radiation exposure such as an aviation
application or extended service life at higher altitudes.
b. SER testing is needed for devices with large numbers of SRAM or DRAM cells ( 1 Mbit). For
example: Since the SER rates for a 130 nm technology are typically near 1000 FIT/MBIT, a
device with only 1,000 SRAM cells will result in an SER contribution of ~1 FIT.
A6.2
Bump material making die to package connections for Flip Chip package applications.
d. Mitigating factors such as implementation of Error Correcting Code (ECC) and Soft Error
Detection (SED).
A6.3
Page 35 of 42
SCOPE
Successful completion of the test requirements in Table 2 allows the claim to be made that the
part is AEC Q100 qualified.
Additional testing may be agreed between Component
Manufacturers and Tier 1 Component Users depending on more demanding application
environments. To address these more stringent conditions, application based Mission Profiles
may be used for a reliability capability.
A mission profile is the collection of relevant environmental and functional loads that a component
will be exposed to during its use lifetime.
A7.1.1
Purpose
This appendix provides information on an approach that can be used to assess the suitability of a
component for a given application and its mission profile for unique requirements. The benefit of
applying this approach is that, in the end, the reliability margin between the component
(specification) space and the application (condition) space may be shown.
A7.1.2
Section A7.2 demonstrates the relation between AEC-Q100 stress conditions / durations
and a typical example of a set of use life time and loading conditions.
Section A7.3 describes the approach, supported by flow charts, which can be used for a
reliability capability assessment starting from a mission profile description.
References
A7.2
BASE CONSIDERATIONSE
A7.2.1
The mission profile itself is generated by adding information on thermal, electrical, mechanical
and any other forms of loading under use conditions to the above lifetime characteristics.
Examples of these and how they relate to the test conditions in Table 2 are shown in Table A7.1.
A7.2.2
Page 36 of 42
A7.3
These considerations may result in extended test durations. In addition, there may be
components manufactured in new technologies and/or containing new materials that are not yet
qualified. In such cases, unknown failure mechanisms may occur with different times-to-failure
which may require different test methods and/or conditions and/or durations.
For these cases, two flow charts are available to facilitate both Tier 1 and Component
Manufacturing in a reliability capability assessment:
Flow Chart 1 in Figure A7.1 describes the process at Component Manufacturer to assess
whether a new component can be qualified by AEC-Q100.
Flow Chart 2 in Figure A7.2 describes (1) the process at Tier 1 to assess whether a
certain electronic component fulfills the requirements of the mission profile of a new
Electronic Control Unit (ECU); and (2) the process at Component Manufacturer to assess
whether an existing component qualified according to AEC-Q100 can be used in a new
application.
For details on how to apply this method, please refer to SAE J1879, SAE J1211, and/or ZVEI
Handbook for Robustness Validation of Semiconductor Devices in Automotive Applications.
In summary, the flow charts result in the following three clear possible conclusions:
[A]
[B]
[C]
In addition, not shown in the flow charts, the expected end of life failure rate may be an important
criterion. Regarding failure rates, the following points should be considered:
No fails in 231 devices (77 devices from 3 lots) are applied as pass criteria for the major
environmental stress tests. This represents an LTPD (Lot Tolerance Percent Defective)
= 1, meaning a maximum of 1% failures at 90% confidence level.
This sample size is sufficient to identify intrinsic design, construction, and/or material
issues affecting performance.
This sample size is NOT sufficient or intended for process control or PPM evaluation.
Manufacturing variation failures (low ppm issues) are achieved through proper process
controls and/or screens such as described in AEC-Q001 and AEC-Q002.
Three lots are used as a minimal assurance of some process variation between lots. A
monitoring process has to be installed to keep process variations under control.
Sample sizes are limited by part and test facility costs, qualification test duration and
limitations in batch size per test.
Page 37 of 42
Figure A7.1: Flow Chart 1 Reliability Test Criteria for New Component
Page 38 of 42
Page 39 of 42
Table A7.1: Basic Calculations for AEC-Q100 Stress Test Conditions and Durations
Loading
Stress Test
Stress Conditions
Acceleration Model
(all temperatures in K, not in C)
Model Parameters
Calculated Test
Duration
Q100 Test
Duration
Arrhenius
tu = 12,000 hr
(average operating use
time over 15 yr)
Operation
Thermomechanical
Tu = 87C
(average junction
temperature in use
environment)
nu = 54,750 cls
(number of engine
on/off cycles over 15 yr
of use)
Tu =76C
(average thermal cycle
temperature change in
use environment)
High
Temperature
Operating
Life
(HTOL)
Tt = 125C
(junction
temperature in
test
environment)
Temperature
Cycling
(TC)
Tt = 205C
(thermal cycle
temperature
change in test
environment:
-55C to +150C)
Humidity
(Option 1)
Tu = 32C
(average temperature
in use environment:
9% @ 87C - time on
and 91% @ 27C - time off)
Ea 1 1
= exp
k B Tu Tt
tu = 131,400 hr
(average on/off time
over 15 yr of use)
RHu = 74%
(average relative
humidity in use
environment)
Temperature
Humidity
Bias
(THB)
RHt = 85%
(relative humidity
in test
environment)
Tt = 85C
(ambient
temperature in
test environment)
Tt
=
Tu
Hallberg-Peck
RH
A =
RH
t
Ea 1 1
exp
k B Tu Tt
Page 40 of 42
Ea = 0.7 eV
(activation energy; 0.7 eV is a
typical value, actual values
depend on failure mechanism and
range from -0.2 to 1.4 eV)
tt = 1393 hr
(test time)
1000 hr
m=4
(Coffin Manson exponent; 4 is to
be used for cracks in hard metal
alloys, actual values depend on
failure mechanisms and range
from 1 for ductile to 9 for brittle
materials)
p=3
(Peck exponent, 3 is to be used
for bond pad corrosion)
Ea = 0.8 eV
(activation energy; 0.8 eV is to be
used for bond pad corrosion)
kB = 8.61733 x 10-5 eV/K
(Boltzmanns Constant)
t
= u
Af
nt =1034 cls
(number of cycles
in test)
n=n
t
1000 cls
Af
Tt = 960 hr
tu
Af
1000 hr
Table A7.1: Basic Calculations for AEC-Q100 Stress Test Conditions and Durations (continued)
Loading
Stress Test
tu = 131,400 hr
(average on/off time
over 15 yr of use)
Humidity
(Option 2)
RHu = 74%
(average relative
humidity in use
environment)
Tu = 32C
(average temperature
in use environment:
9% @ 87C - time on
and 91% @ 27C - time off)
Highly
Accelerated
Steam
Test
(HAST)
Stress
Conditions
RHt = 85%
(relative
humidity in test
environment)
Tt = 130C
(ambient
temperature in
test environment)
Acceleration Model
(all temperatures in K, not in C)
Hallberg-Peck
RH
A =
RH
t
Ea
exp
kB
1 1
Tu Tt
Model Parameters
p=3
(Peck exponent, 3 is to be used
for bond pad corrosion)
Ea = 0.8 eV
(activation energy; 0.8 eV is to be
used for bond pad corrosion)
Calculated Test
Duration
Q100 Test
Duration
Tt = 53 hr
tu
Af
96 hr
Notes:
Autoclave (121C/100%RH) is a highly accelerated test using a saturated moisture condition that will tend to uncover failure mechanisms not seen in normal use conditions. For
this reason, autoclave is not a test whose test conditions can be derived through models and assumptions. The current test conditions were selected decades ago and the test
has been used as part of a standard qualification ever since.
Most Pressure Pot testing is performed with an Al Pressure Pot. Air purging is done at 100C boiling water, and with both steam and liquid escaping from the vent. The chamber
walls are not independently heated at all. Control of the chamber wall temperature; air purging procedure, during ramp-up; ramp-down temperature and pressure and overall
temperature and pressure are key. In addition, when the test is ended the heater is turned off and the vent is opened. It takes about 3 minutes to fully vent the pot. A significant
concern is that venting before the pot chamber drops to 100C, can cause a pressure differential from the >100C residual hot device and cause any water trapped in device void
to create a pop-corning type of delamination.
Page 41 of 42
Revision History
Rev #
Date of change
June 9, 1994
Initial Release.
Added copyright statement. Revised sections 2.3, 2.4.1, 2.4.4, 2.4.5, 2.8,
3.2 and 4.2, Tables 2, 3, 4 and Appendix 1, 2. Added Appendix 3.
Sept. 6, 1996
Revised sections 1.1, 1.2.3, 2.3, 3.1, and 3.2.1, Tables 2, 3, and 4, and
Appendix 2.
Oct. 8, 1998
Revised sections 1.1, 1.1.3, 1.2.2, 2.2, 2.3, 2.4.2, 2.4.5, 2.6, 3.1, 3.2.1,
3.2.3, 2.3.4, 4.1, and 4.2, Tables 3 and 4, Appendix 2, and Appendix 3.
Added section 1.1.1, Figures 1, 2, and 3, and Test Methods Q100-008 and
-009. Deleted sections 2.7 and 2.8.
Revised Figure 4.
Complete Revision.
Complete Revision. Revised document title to reflect that the stress test
qualification requirements are failure mechanism based. Revised sections
1, 1.1, 1.2.1, 1.2.2, 1.2.3, 2.3.1, 2.4.4, 2.5, 3.2, 3.2.3, 4.2, and 4.3, Figure
2, Tables 2 and 3, Appendix 2, Appendix 4A, and Appendix 4B. Added
sections 2.1.1, 3.1.1, Table 2 and 3 entries (test #D4, D5, E10, and E11),
Appendix 6, and Test Method Q100-012. Deleted Table 2A.
Complete Revision. Revised sections 1.2.1, 1.3.1, 1.3.3, 2.2, 2.3.1, 2.3.3,
2.4.1, 2.4.5, 2.5, and 3.2.3, Figure 2, Tables 1 and 2, Appendix 1,
Appendix 4A, Appendix 4B, and Revision History. Added Revision
Summary, sections 1.2.4, 1.3.2, 1.3.4, 1.3.5, and 3.3, Table 2 and 3 entry
(test #E12), Table 2 Legend (Note L), Tables A1.1 and A1.2, Appendix 7,
Figures A7.1 and A7.2, and Table A7.1. Deleted section 3.1.1, Table 2
and 3 entries (test #E2 and E8).
Page 42 of 42