← pick another file
Log in
Photolithography etching process.svg
View on Commons
Default language
français
to
Select a language
substrate
oxide
PR
glass
Cr
a.
Prepare wafer
b.
Apply photoresist
c.
Align photomask
d.
Expose to UV light
e.
Develop and
remove photoresist
exposed to UV light
f.
Etch exposed oxide
g.
Remove remaining
photoresist
Upload to Commons
or
Download
Log in to enable uploading